Chemical bonding, structure, and hardness of carbon nitride thin films

Diamond and Related Materials

Volumn 9, Issue 9-10, 2000, Pages 1790-1794

  Zheng, W T ^a,c   Yu, W X ^a   Li, H B ^a   Wang, Y M ^a   Cao, P J ^a   Jin, Z S ^a   Broitman, E ^b   Sundgren, J E ^b  

^a JILIN UNIVERSITY   (China)

^b LINKÖPING UNIVERSITY   (Sweden)

^c DALIAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (China)

Author keywords

Bonding; Hardness; Nitrides; Structure

Indexed keywords

ATOM; CARBON NITRIDE; CHEMICAL BOND; CRYSTAL STRUCTURE; FILM; INFRARED SPECTROSCOPY; TEMPERATURE;

CHEMICAL BONDS; FILM GROWTH; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HARDNESS; MAGNETRON SPUTTERING; RESONANCE; SILICON; STRESSES; STRUCTURE (COMPOSITION); THERMAL EFFECTS; THIN FILMS;

CARBON NITRIDE; NANOINDENTATION; NEAR EDGE X RAY ABSORPTION FINE STRUCTURE;

NITRIDES;

CARBON NITRIDE; CHEMICAL STRUCTURE; HARDNESS; INORGANIC COATING;

EID: 0034282128     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0925-9635(00)00314-9     Document Type: Conference Paper

References (12)