Cytocompatibility of amorphous hydrogenated carbon nitride films deposited by CH4/N2 dielectric barrier discharge plasmas with respect to cell lines

Journal of Applied Physics

Volumn 104, Issue 7, 2008, Pages

  Majumdar, Abhijit ^a   Schröder, Karsten ^b   Hippler, Rainer ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

^b LEIBNIZ INSTITUTE FOR PLASMA SCIENCE AND TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON; ANIMAL CELL CULTURE; ATMOSPHERIC PRESSURE; CARBON FILMS; CARBON NITRIDE; CELL CULTURE; CELL DEATH; CELLS; CYTOLOGY; DIELECTRIC DEVICES; DISCHARGE (FLUID MECHANICS); ELECTRIC DISCHARGES; FLOW CONTROL; HYDROGENATION; HYDROGENOLYSIS; INFRARED SPECTROSCOPY; MAMMALS; NITRIDES; PHOTOELECTRON SPECTROSCOPY; PLASMA THEORY; PLASMAS; SPECTROSCOPIC ANALYSIS; SPECTRUM ANALYSIS; SURFACE ROUGHNESS; X RAY PHOTOELECTRON SPECTROSCOPY;

AMORPHOUS HYDROGENATED CARBONS; ATOMIC FORCES; CELL LINES; CHEMICAL COMPOSITIONS; CNX FILMS; CYTOCOMPATIBILITY; CYTOTOXIC; DIELECTRIC BARRIER DISCHARGE PLASMAS; FILM QUALITIES; FOURIER; GLASS SUBSTRATES; HUMAN EMBRYONIC KIDNEYS; MAMMALIAN CELL LINES; MICROSCOPIC IMAGES; PC12 CELLS; PHEOCHROMOCYTOMA; TIME SPANS; X-RAY PHOTOELECTRON SPECTROSCOPIES;

AMORPHOUS FILMS;

EID: 54049134770     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2990054     Document Type: Article

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