Chemical composition and bond structure of carbon-nitride films deposited by CH4/N2 dielectric barrier discharge

Surface and Coatings Technology

Volumn 201, Issue 14, 2007, Pages 6437-6444

  Majumdar, Abhijit ^a   Schäfer, Jan ^a   Mishra, Puneet ^b   Ghose, Debabrata ^b   Meichsner, Jürgen ^a   Hippler, Rainer ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

^b SAHA INSTITUTE OF NUCLEAR PHYSICS   (India)

Author keywords

CN film; Dielectric barrier discharge; Infrared spectroscopy; XPS

Indexed keywords

ATOMIC FORCE MICROSCOPY; CARBON FILMS; CHEMICAL ANALYSIS; DEPOSITION; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INFRARED SPECTROSCOPY; RAMAN SPECTROSCOPY; STRUCTURE (COMPOSITION); SURFACE MORPHOLOGY; X RAY PHOTOELECTRON SPECTROSCOPY;

BOND STRUCTURE; CARBON NITRIDE FILMS; DEPOSITED FILMS; DIELECTRIC BARRIER DISCHARGE;

CARBON NITRIDE;

ATOMIC FORCE MICROSCOPY; CARBON FILMS; CARBON NITRIDE; CHEMICAL ANALYSIS; DEPOSITION; ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INFRARED SPECTROSCOPY; RAMAN SPECTROSCOPY; STRUCTURE (COMPOSITION); SURFACE MORPHOLOGY; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 33847028296     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2006.12.011     Document Type: Article

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