SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 355, Issue , 1999, Pages 117-121

Deposition of carbon nitride films by ionized magnetron sputtering

(5) Kusano, Y a Christou, C a Barber, Z H a Evetts, J E a Hutchings, I M a

a UNIVERSITY OF CAMBRIDGE (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; FOURIER TRANSFORM INFRARED SPECTROSCOPY; IONIZATION; MAGNETRON SPUTTERING; NITRIDES; PLASMAS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SUBSTRATES;

CARBON NITRIDE; IONIZED MAGNETRON SPUTTERING;

AMORPHOUS FILMS;

EID: 0033357215 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(99)00510-6 Document Type: Article

Times cited : (19)

References (16)

1
- 20444373328
- Liu A.Y., Cohen M.L. Science. 245:1989;841.
- (1989) Science , vol.245 , pp. 841
- Liu, A.Y.¹ Cohen, M.L.²

2
- 0030647936
- Freire F.L. Jr., Franceschini D.F. Thin Solid Films. 293:1997;236.
- (1997) Thin Solid Films , vol.293 , pp. 236
- Freire F.L., Jr.¹ Franceschini, D.F.²

3
- 0031145304
- Ong C.W., Zhao X.A., Tsang Y.C., Choy C.L., Chan P.W. J. Mater. Sci. 32:1997;2347.
- (1997) J. Mater. Sci. , vol.32 , pp. 2347
- Ong, C.W.¹ Zhao, X.A.² Tsang, Y.C.³ Choy, C.L.⁴ Chan, P.W.⁵

4
- 0000364612
- J. Hu, P. Yang, C.M. Lieber, Phys. Rev. B 57 (6) (1998) R3185.
- (1998) Phys. Rev. B , vol.57 , Issue.6
- Hu, J.¹ Yang, P.² Lieber, C.M.³

5
- 0031546183
- Enders B., Horino Y., Tsubouchi N., Chayahara A., Kinomura A., Fujii K. Nucl. Instrum. Methods Phys. Res. B. 121:1997;73.
- (1997) Nucl. Instrum. Methods Phys. Res. B , vol.121 , pp. 73
- Enders, B.¹ Horino, Y.² Tsubouchi, N.³ Chayahara, A.⁴ Kinomura, A.⁵ Fujii, K.⁶

6
- 0032045527
- Takai O., Taki Y., Kitagawa T. Thin Solid Films. 317:1998;380.
- (1998) Thin Solid Films , vol.317 , pp. 380
- Takai, O.¹ Taki, Y.² Kitagawa, T.³

7
- 0032476356
- Kusano Y., Evetts J.E., Somekh R.E., Hutchings I.M. Thin Solid Films. 332:1998;56.
- (1998) Thin Solid Films , vol.332 , pp. 56
- Kusano, Y.¹ Evetts, J.E.² Somekh, R.E.³ Hutchings, I.M.⁴

8
- 0040955708
- Kumar S., Tonselg T.L., Wielunski L.S. J. Phys. D: Appl. Phys. 28:1995;2335.
- (1995) J. Phys. D: Appl. Phys. , vol.28 , pp. 2335
- Kumar, S.¹ Tonselg, T.L.² Wielunski, L.S.³

9
- 0040284593
- Greene J.E., Motooka T., Sundgren J.E., Rockett A., Gorbatkin S., Lubben D., Barnett S.A. J. Cryst. Growth. 79:1986;19.
- (1986) J. Cryst. Growth , vol.79 , pp. 19
- Greene, J.E.¹ Motooka, T.² Sundgren, J.E.³ Rockett, A.⁴ Gorbatkin, S.⁵ Lubben, D.⁶ Barnett, S.A.⁷

10
- 0025627326
- IEEE Trans
- Sanders D.M., Boercker D.B., Falabella S. IEEE Trans. Plasma Sci. 18:1990;883.
- (1990) Plasma Sci. , vol.18 , pp. 883
- Sanders, D.M.¹ Boercker, D.B.² Falabella, S.³

11
- 0000522608
- Rossnagel S., Hopwood J. J. Vac. Sci. Technol. B. 12:(1):1994;449.
- (1994) J. Vac. Sci. Technol. B , vol.12 , Issue.1 , pp. 449
- Rossnagel, S.¹ Hopwood, J.²

12
- 21844484392
- D. Li, S. Lopez, Y.W. Chung, M.S. Wong, W.D. Sproul, J. Vac. Sci. Technol. A 13 (3) (1995) 1063.
- (1995) J. Vac. Sci. Technol. A , vol.13 , Issue.3 , pp. 1063
- Li, D.¹ Lopez, S.² Chung, Y.W.³ Wong, M.S.⁴ Sproul, W.D.⁵

13
- 0025464039
- M.R. Wixom, J. Am. Ceram. Soc. 73 (7) (1990) 1973.
- (1990) J. Am. Ceram. Soc. , vol.73 , Issue.7 , pp. 1973
- Wixom, M.R.¹

14
- 0032666348
- Monclus M.A., Cameron D.C., Chowdhury A.K.M.S. Thin Solid Films. 341:1999;94.
- (1999) Thin Solid Films , vol.341 , pp. 94
- Monclus, M.A.¹ Cameron, D.C.² Chowdhury, A.K.M.S.³

15
- 0008896142
- Kusano Y., Evetts J.E., Hutchings I.M. Thin Solid Films. 250:1999;343-344.
- (1999) Thin Solid Films , vol.250 , pp. 343-344
- Kusano, Y.¹ Evetts, J.E.² Hutchings, I.M.³

16
- 0031557878
- N. Xu, Y. Du, Z. Ying, Z. Ren, F. Li, J. Lin, Y. Ren, X. Zong, J. Phys. D: Appl. Phys. 30 (1997) 1370.
- (1997) J. Phys. D: Appl. Phys. , vol.30 , pp. 1370
- Xu, N.¹ Du, Y.² Ying, Z.³ Ren, Z.⁴ Li, F.⁵ Lin, J.⁶ Ren, Y.⁷ Zong, X.⁸

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.