Role of delocalized nitrogen in determining the local atomic arrangement and mechanical properties of amorphous carbon nitride thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 6, 2000, Pages 2964-2971

  Holloway, B C ^a   Kraft, O ^b   Shuh, D K ^c   Nix, W D ^d   Kelly, M ^d   Pianetta, P ^d   Hagstrom S ^d  

^a The College of William and Mary   (United States)

^b MAX PLANCK INSTITUTE FOR INTELLIGENT SYSTEMS   (Germany)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^d STANFORD UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; ELASTIC MODULI; FOURIER TRANSFORM INFRARED SPECTROSCOPY; MAGNETRON SPUTTERING; MOLECULAR STRUCTURE; NANOTECHNOLOGY; NITRIDES; SPUTTER DEPOSITION; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

CARBON NITRIDE; NANOINDENTATION; OLIVER-PHARR METHOD;

AMORPHOUS FILMS;

EID: 0034318833     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1308592     Document Type: Article

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