Multi-technique characterization of tantalum oxynitride films prepared by reactive direct current magnetron sputtering

Thin Solid Films

Volumn 514, Issue 1-2, 2006, Pages 1-9

  Venkataraj, S ^a   Kittur, H ^a   Drese, R ^a   Wuttig, M ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

Ellipsometry; Sputtering; Tantalum oxynitride; X ray reflectivity

Indexed keywords

ELLIPSOMETRY; MAGNETRON SPUTTERING; MIXTURES; OPTICAL PROPERTIES; REFRACTIVE INDEX; RUTHERFORD BACKSCATTERING SPECTROSCOPY; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

RUTHERFORD BACKSCATTERING; TANTALUM OXYNITRIDE; WAFER CURVATURE MEASUREMENTS; X-RAY REFLECTIVITY;

THIN FILMS;

EID: 33745737646     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2005.08.320     Document Type: Article

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