Simulations of scatterometry down to 22 nm structure sizes and beyond with special emphasis on LER

AIP Conference Proceedings

Volumn 1173, Issue , 2009, Pages 371-378

  Osten, W ^a   Paz, V Ferreras ^a   Frenner, K ^a   Schuster, T ^a   Bloess, H ^b  

^a UNIVERSITY OF STUTTGART   (Germany)

^b QIMONDA DRESDEN GMBH AND CO OHG   (Germany)

Author keywords

22 nm; CD; Line edge roughness; Metrology; RCWA; Scatterometry; Sensitivity

Indexed keywords

EID: 70450248590     PISSN: 0094243X     EISSN: 15517616     Source Type: Conference Proceeding    
DOI: 10.1063/1.3251253     Document Type: Conference Paper

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