Modeling the effect of line profile variation on optical critical dimension metrology

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6518, Issue PART 1, 2007, Pages

  Germer, Thomas A ^a  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

Author keywords

Gratings; Line edge variation; Optical critical dimension metrology; Scatterometry

Indexed keywords

LINE PROFILE VARIATIONS; OPTICAL CRITICAL DIMENSION METROLOGY; SCATTEROMETRY;

ANGLE MEASUREMENT; APPROXIMATION THEORY; PARAMETER ESTIMATION; PHOTORESISTS; POLARIZATION; SILICON;

DIFFRACTION GRATINGS;

EID: 35148839022     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.704246     Document Type: Conference Paper

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