High quality plasma enhanced chemical vapour deposited silicon oxide gas barrier coatings on polyester films

Thin Solid Films

Volumn 516, Issue 10, 2008, Pages 3081-3088

  Howells, D G ^a   Henry, B M ^a   Madocks, J ^b   Assender, H E ^a  

^a UNIVERSITY OF OXFORD   (United Kingdom)

^b General Plasma Inc   (United States)

Author keywords

Atomic force microscopy; Gas barrier; Organic substrates; Plasma enhanced chemical vapour deposition (PECVD); Polyester; Scanning electron microscopy; Silicon oxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; PERMEATION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYESTERS; SCANNING ELECTRON MICROSCOPY; SILICON COMPOUNDS;

GAS BARRIER; ORGANIC SUBSTRATES; WATER VAPOUR PERMEATION;

POLYMER FILMS;

EID: 39649086082     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.11.017     Document Type: Article

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