High-rate SiO2 deposition by oxygen cold arc plasma jet at atmospheric pressure

Plasma Processes and Polymers

Volumn 5, Issue 9, 2008, Pages 861-866

  Han, Man H ^a   Noh, Joo H ^a   Lee, Tae I ^a   Choi, Jai H ^a   Park, Ki W ^a   Hwang, Hyeon S ^a   Song, Kie M ^b   Baik, Hong K ^a  

^a Yonsei University   (South Korea)

^b Konkuk University   (South Korea)

Author keywords

Atmospheric pressure plasma jets; Atomic oxygen; Cold plasmas; Organosilicon precursors; SiO2 deposition

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; ATOMIC PHYSICS; ATOMS; CAVITY RESONATORS; CHEMICAL PROPERTIES; DEPOSITION; OXYGEN; PLASMA ACCELERATORS; PLASMA DEPOSITION; PLASMA DEVICES; PLASMA JETS; PLASMAS; SILICON COMPOUNDS;

ATMOSPHERIC-PRESSURE PLASMA JETS; ATOMIC OXYGEN; COLD PLASMAS; ORGANOSILICON PRECURSORS; SIO2 DEPOSITION;

JETS;

EID: 60049086479     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200800061     Document Type: Article

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