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Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms
Volumn 192, Issue 4, 2002, Pages 420-428
Characterization by RBS of hyper-thin SiO2 layers on various polymers
(5)
Dennler, G
a
Houdayer, A
a
Raynaud, P
b
Segui Y
b
Wertheimer, M R
a
a
ÉCOLE POLYTECHNIQUE DE MONTRÉAL
(
Canada
)
b
Laboratoire Plasma et Conversion d'Energie
(
France
)
Author keywords
Interface; Ion beam modification; PECVD; Polymers; RBS; SiO2
Indexed keywords
ALPHA PARTICLES; FILM GROWTH; INORGANIC COATINGS; ION BEAMS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; POLYCARBONATES; POLYETHYLENE TEREPHTHALATES; POLYIMIDES; SCANNING ELECTRON MICROSCOPY; SILICA; SUBSTRATES; SURFACE STRUCTURE; THIN FILMS;
ION BEAM MODIFICATIONS (IBM);
RUTHERFORD BACKSCATTERING SPECTROSCOPY;
EID
:
0036608581
PISSN
:
0168583X
EISSN
:
None
Source Type
:
Journal
DOI
:
10.1016/S0168-583X(02)00492-5
Document Type
:
Article
Times cited : (
26
)
References (
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.
