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Volumn 13, Issue 5, 2001, Pages 1884-1895

Oligomerization and polymerization steps in remote plasma chemical vapor deposition of silicon-carbon and silica films from organosilicon sources

(5) Wrobel A M a Walkiewicz Pietrzykowska, A a Hatanaka, Y b Wickramanayaka, S b,c Nakanishi, Y b

a CENTRE OF MOLECULAR AND MACROMOLECULAR STUDIES (Poland)

b SHIZUOKA UNIVERSITY (Japan)

c Canon ANELVA Technix Corporation (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; ORGANOSILICON DERIVATIVE; SILANE DERIVATIVE; SILICON; SILICON DIOXIDE;

ARTICLE; CHEMICAL BOND; CHEMICAL REACTION KINETICS; FILM; HYDROGENATION; MOLECULAR WEIGHT; OLIGOMERIZATION; POLYMERIZATION; REACTION ANALYSIS;

EID: 0034847213 PISSN: 08974756 EISSN: None Source Type: Journal
DOI: 10.1021/cm001044+ Document Type: Article

Times cited : (41)

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