DC sputtered w-doped V0 2 thermochromic thin films for smart windows with active solar control

Journal of Nanoscience and Nanotechnology

Volumn 9, Issue 7, 2009, Pages 4220-4226

  Batista, C ^a   Ribeiro, R ^a   Carneiro, J ^a   Teixeira, V ^a  

^a UNIVERSITY OF MINHO   (Portugal)

Author keywords

Magnetron sputtering; Smart windows; Thermochromic films; Tungsten doping; Vanadium dioxide

Indexed keywords

CRITICAL LEVEL; DIRECT CURRENT MAGNETRON SPUTTERING; DOPANT CONCENTRATIONS; DOPED FILMS; ELONGATED GRAINS; FILM PLANES; FLOAT-GLASS; LINEAR BEHAVIOR; PROCESSING CONDITION; ROUGHNESS LEVEL; SINGLE PHASE; SMART WINDOWS; SOLAR CONTROL; THERMO-CHROMIC; THERMOCHROMIC FILMS; TRANSITION TEMPERATURE; TUNGSTEN CONTENT; TUNGSTEN DOPING; UNDOPED FILMS; VANADIUM DIOXIDE; VISIBLE REGION;

CRYSTAL ORIENTATION; CRYSTALLIZATION; DOPING (ADDITIVES); MAGNETRONS; SUPERCONDUCTING TRANSITION TEMPERATURE; THIN FILMS; TUNGSTEN; VANADIUM; VANADIUM ALLOYS; WINDOWS;

SOLAR CONTROL FILMS;

EID: 70350291676     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2009.M36     Document Type: Conference Paper

References (40)

1. F. J. Morin, Phys. Rev. Lett. 3, 34 (1959).
2. A. Zylbersztejn and N. F. Mott, Phys. Rev. B 11, 4383 (1975).
3. W. Burkhardt, T. Christmann, B. K. Meyer, W. Niessner, D. Schalch, and A. Scharmann, Thin Solid Films 345, 229 (1999).
4. M. A. Sobhan, R. T. Kivaisi, B. Stjerna, and C. G. Granqvist, Sol. Energy Mater. Sol. Cells 44, 451 (1996).
5. T. D. Manning, I. P. Parkin, M. E. Pemble, D. Sheel, and D. Vernardou, Chem. Mater. 16, 744 (2004).
6. P. Jin, S. Nakao, and S. Tanemura, Ion Implantation Technology Proceedings, 1998 International Conference (1998), Vol.2, pp. 1051-1054.
7. R. Binions, C. Piccirillo, and I. P. Parkin, Surf. Coat. Technol. 201, 9369 (2007).
8. I. P. Parkin and T. D. Manning, J. Chem. Educ. 83, 393 (2006).
9. P. Jin and S. Tanemura, Thin Solid Films 281-282, 239 (1996).
10. T. D. Manning, I. P. Parkin, C. Blackman, and U. Qureshi, J. Mater. Chem. 15, 4560 (2005).
11. T. J. Hanlon, J. A. Coath, and M. A. Richardson, Thin Solid Films 436, 269 (2003).
12. W. Burkhardt, T. Christmann, S. Franke, W. Kriegseis, D. Meister, B. K. Meyer, W. Niessner, D. Schalch, and A. Scharmann, Thin Solid Films 402, 226 (2002).
13. H.-K. Chen, H.-C. Hung, T. C.-K. Yang, and S.-F. Wang, J. Non- Cryst. Solids 347, 138 (2004).
14. E. Cavanna, J. P. Segaud, and J. Livage, Mater. Res. Bull. 34, 167 (1999).
15. T. J. Hanlon, R. E. Walker, J. A. Coath, and M. A. Richardson, Thin Solid Films 405, 234 (2002).
16. D. Vernardou, M. E. Pemble, and D. W. Sheel, Chem. Vap. Deposition 12, 263 (2006).
17. C. Piccirillo, R. Binions, and I. P. Parkin, Thin Solid Films 516, 1992 (2008).
18. G. S. Elwin and I. P. Parkin, Chem. Vap. Deposition 6, 59 (2000).
19. D. Vernardou, M. E. Pemble, and D. W. Sheel, Surf. Coat. Technol. 188-189,250 (2004).
20. M. Maaza, K. Bouziane, J. Maritz, D. S. McLachlan, R. Swanepool, J. M. Frigerio, and M. Every, Opt. Mater. 15, 41 (2000).
21. D. H. Kim and H. S. Kwok, Appl. Phys. Lett. 65, 3188 (1994).
22. R. T. R. Kumar, B. Karunagaran, D. Mangalaraj, S. K. Narayandass, P. Manoravi, and M. Joseph, J. Mater. Sci. 39, 2869 (2004).
23. S. H. Chen, X. J. Yi, H. Ma, T. Xiong, H. C. Wang, and C. J. Ke, International Journal of Infrared and Millimeter Waves 25, 157 (2004).
24. N. Renard, C. Sella, O. Nemraoui, M. Maaza, Y. Sampeur, and J. Lafait, Surf. Coat. Technol. 98, 1477 (1998).
25. S. H. Chen, H. Ma, S. B. Wang, N. Shen, J. Xiao, H. Zhou, X. M. Zhao, Y. Li, and X. J. Yi, Thin Solid Films 497, 267 (2006).
26. J. Cui, D. Da, and W. Jiang, Appl. Surf. Sci 133, 225 (1998).
27. J. Duchene, M. Terraillon, and M. Pailly, Thin Solid Films 12, 231 (1972).
28. P. Jin, M. Tazawa, K. Yoshimura, K. Igarashi, S. Tanemura, K. Macak, and U. Helmersson, Thin Solid Films 375, 128 (2000).
29. R. T. Kivaisi and M. Samiji, Sol. Energy Mater. Sol. Cells 57, 141 (1999).
30. H. Miyazaki, H. Sakamura, M. Kamei, and I. Yasui, Solid State Ionics 122, 223 (1999).
31. H. Miyazaki and I. Yasui, J. Phys. D-Appl. Phys. 39, 2220 (2006).
32. Y. Shigesato, H. Miyazaki, F. Utsuno, and I. Yasui, Thin Solid Films 281-282, 436 (1996).
33. J. A. Theil, E. Kusano, and A. Rockett, Thin Solid Films 298, 122 (1997).
34. X. J. Wang, H. D. Li, Y. J. Fei, X. Wang, Y. Y. Xiong, Y. X. Nie, and K. A. Feng, Appl. Surf. Sci. 177, 8 (2001).
35. X. J. Wang, Y. J. Fei, Y. Y. Xiong, Y. X. Nie, K. A. Feng, and L. D. Li, Chinese Physics 11, 737 (2002).
36. Y. S. Yoon, J. S. Kim, and S. H. Choi, Thin Solid Films 460, 41 (2004).
37. C. Batista, J. Mendes, V. Teixeira, and J. Carneiro, Mater. Sci. Forum 587-588, 343 (2008).
38. C. Batista, V. Teixeira, and J. Carneiro, Journal of Nano Research 2, 21 (2008).
39. T. Christmann, B. Felde, W. Niessner, D. Schalch, and A. Scharmann, Thin Solid Films 287, 134 (1996).
40. C. D. Wagner, L. E. Davis, M. V. Zeller, J. A. Taylor, R. H. Raymond, and L. H. Gale, Surf. Interface Anal. 3, 211 (1981).