Substrate bias effect on the fabrication of thermochromic VO2 films by reactive RF sputtering

Journal of Physics D: Applied Physics

Volumn 39, Issue 10, 2006, Pages 2220-2223

  Miyazaki, H ^a   Yasui, I ^b  

^a SHIMANE UNIVERSITY   (Japan)

^b UNITED NATIONS UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC POTENTIAL; FILM GROWTH; MAGNETRON SPUTTERING; NATURAL FREQUENCIES; SUBSTRATES; SUPERCONDUCTING TRANSITION TEMPERATURE; VANADIUM COMPOUNDS;

RF MAGNETRON SPUTTERING; SUBSTRATE BIAS EFFECT; VANADIUM OXIDE; VO2 FILMS;

THIN FILMS;

EID: 33646732447     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/39/10/034     Document Type: Article

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