Tungsten doped vanadium dioxide thin films prepared by atmospheric pressure chemical vapour deposition from vanadyl acetylacetonate and tungsten hexachloride

Surface and Coatings Technology

Volumn 201, Issue 22-23 SPEC. ISS., 2007, Pages 9369-9372

  Binions, Russell ^a   Piccirillo, Clara ^a   Parkin, Ivan P ^a  

^a UNIVERSITY COLLEGE LONDON   (United Kingdom)

Author keywords

APCVD; Thermochromic; Thin films; Vanadium dioxide

Indexed keywords

CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; REFLECTOMETERS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; TUNGSTEN; VANADIUM COMPOUNDS;

ATMOSPHERIC PRESSURE CHEMICAL VAPOUR DEPOSITION; GLASS SUBSTRATES; THERMOCHROMIC; TUNGSTEN DOPED VANADIUM DIOXIDE;

THIN FILMS;

CHEMICAL VAPOR DEPOSITION; MORPHOLOGY; REFLECTOMETERS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DOPING; THIN FILMS; TUNGSTEN; VANADIUM COMPOUNDS;

EID: 34547662518     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2007.03.026     Document Type: Article

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