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Materials Science Forum

Volumn 587-588, Issue , 2008, Pages 343-347

Reactive DC magnetron sputtering of vanadium oxide thin films

(4) Batista, C a Mendes, J a Teixeira, V a Carneiro, J a

a UNIVERSITY OF MINHO (Portugal)

Author keywords

Characterization; Morphology; Reactive dc magnetron sputtering; Structure; Vanadium oxide

Indexed keywords

ATOMIC FORCE MICROSCOPY; MAGNETRON SPUTTERING; MORPHOLOGY; OXIDES; SCANNING ELECTRON MICROSCOPY; STRUCTURE (COMPOSITION); SURFACE MORPHOLOGY; THIN FILMS; VANADIUM DIOXIDE; X RAY DIFFRACTION ANALYSIS;

DIRECT CURRENT MAGNETRON SPUTTERING; OPTICAL SPECTROPHOTOMETRY; PHYSICAL AND CHEMICAL PROPERTIES; RADIO FREQUENCY MAGNETRON SPUTTERING; REACTIVE DC MAGNETRON SPUTTERING; TECHNOLOGICAL APPLICATIONS; VANADIUM OXIDE THIN FILMS; VANADIUM OXIDES;

OXIDE FILMS;

EID: 60349092854 PISSN: 02555476 EISSN: 16629752 Source Type: Book Series
DOI: 10.4028/www.scientific.net/msf.587-588.343 Document Type: Conference Paper

Times cited : (7)

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