XRD and Raman study of vanadium oxide thin films deposited on fused silica substrates by RF magnetron sputtering

Applied Surface Science

Volumn 177, Issue 1-2, 2001, Pages 8-14

  Wang, X J ^a   Li, H D ^b   Fei, Y J ^a   Wang, X ^c   Xiong, Y Y ^a   Nie, Y X ^d   Feng, K A ^a  

^a INSTITUTE OF GEOLOGY AND GEOPHYSICS   (China)

^b PEKING UNIVERSITY   (China)

^c UNIVERSITY OF SCIENCE AND TECHNOLOGY BEIJING   (China)

^d INSTITUTE OF PHYSICS   (China)

Author keywords

Raman spectra; RF magnetron sputtering; Vanadium oxides thin films; X ray diffraction

Indexed keywords

ANNEALING; FUSED SILICA; MAGNETRON SPUTTERING; RAMAN SPECTROSCOPY; SUBSTRATES; THIN FILMS; VANADIUM COMPOUNDS; X RAY DIFFRACTION ANALYSIS;

VANADIUM OXIDE THIN FILMS;

SEMICONDUCTING FILMS;

EID: 0035371451     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(00)00918-1     Document Type: Article

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