Structural and optical characterization of VOx films doped with W by ion implantation

Proceedings of the International Conference on Ion Implantation Technology

Volumn 2, Issue , 1999, Pages 1051-1054

  Jin, Ping ^a   Nakao, Setsuo ^a   Tanemura, Sakae ^a  

^a NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHIZATION; AMORPHOUS FILMS; ANNEALING; SEMICONDUCTOR DOPING; TUNGSTEN; VANADIUM COMPOUNDS;

HIGH-ENERGY ION IMPLANTATION;

ION IMPLANTATION;

EID: 0033350751     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)