Effects of plasma spatial profile on conversion efficiency of laser-produced plasma sources for EUV lithography

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 4, 2009, Pages

  Hassanein, Ahmed ^a   Sizyuk, Valeryi ^a   Sizyuk, Tatyana ^a   Harilal, Sivanandan ^a  

^a Purdue University   (United States)

Author keywords

Center for materials under extreme environments (CMUXE); Discharge produced plasma (DPP); Extreme ultraviolet (EUV) lithography; High energy interaction with general heterogeneous target systems (HEIGHTS); Laser produced plasma (LPP); Magnetohydrodynamic (MHD); Photon transport

Indexed keywords

CONVERSION EFFICIENCY; DEBRIS; ECOLOGY; ELECTRIC DISCHARGES; FLUID DYNAMICS; LASER PRODUCED PLASMAS; LASER PULSES; LASERS; LITHOGRAPHY; MAGNETOHYDRODYNAMICS; PHOTONS; PULSED LASER APPLICATIONS; TARGETS; TIN; ULTRAVIOLET DEVICES;

CENTER FOR MATERIALS UNDER EXTREME ENVIRONMENTS (CMUXE); DISCHARGE-PRODUCED PLASMA (DPP); EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; HIGH ENERGY INTERACTION WITH GENERAL HETEROGENEOUS TARGET SYSTEMS (HEIGHTS); LASER-PRODUCED PLASMA (LPP); MAGNETOHYDRODYNAMIC (MHD); PHOTON TRANSPORT;

PLASMA DIAGNOSTICS;

EID: 70349906944     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3224901     Document Type: Article

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