Three-dimensional simulation of laser-produced plasma for extreme ultraviolet lithography applications

Journal of Applied Physics

Volumn 100, Issue 10, 2006, Pages

  Sizyuk, V ^a   Hassanein, A ^a   Sizyuk, T ^a  

^a ARGONNE NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER SIMULATION; HEAT CONDUCTION; LASER BEAMS; LIGHT SOURCES; LITHOGRAPHY; MONTE CARLO METHODS;

CONVERSION EFFICIENCY; EXTREME ULTRAVIOLET (EUV) LITHOGRAPHY; LASER LOCATIONS; THREE-DIMENSIONAL GEOMETRY;

LASER PRODUCED PLASMAS;

EID: 33845207948     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2365717     Document Type: Article

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