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Volumn 20, Issue 39, 2009, Pages
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Direct fabrication of integrated 3D Au nanobox arrays by sidewall deposition with controllable heights and thicknesses
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Author keywords
[No Author keywords available]
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Indexed keywords
BI-LAYER;
BOTTOM LAYERS;
CLEANING PROCESS;
DEPOSITION TIME;
DRY DEPOSITION TECHNIQUE;
FABRICATION METHOD;
GEOMETRIC EFFECTS;
HIGH REPRODUCIBILITY;
HOLLOW NANOSTRUCTURES;
ION MILLING;
NANO-IMPRINT;
NANO-METER SCALE;
NANO-PILLAR ARRAYS;
NANOBOXES;
PATTERNED MOLDS;
RESOLUTION LIMITS;
SCANNING ELECTRON MICROSCOPE;
SEM;
SPUTTERING METHODS;
CHEMICAL VAPOR DEPOSITION;
DEPOSITION;
FABRICATION;
FUNCTIONAL MATERIALS;
GOLD;
MOLDS;
NANOIMPRINT LITHOGRAPHY;
NANOSTRUCTURES;
PULSED LASER DEPOSITION;
SCANNING ELECTRON MICROSCOPY;
THREE DIMENSIONAL;
REACTIVE ION ETCHING;
GOLD;
NANOMATERIAL;
ARTICLE;
DRY DEPOSITION;
GEOMETRY;
MATERIAL COATING;
NANOARRAY;
NANOFABRICATION;
PARTICLE SIZE;
PRIORITY JOURNAL;
REPRODUCIBILITY;
SIDEWALL DEPOSITION;
TECHNIQUE;
THICKNESS;
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EID: 70349157263
PISSN: 09574484
EISSN: 13616528
Source Type: Journal
DOI: 10.1088/0957-4484/20/39/395301 Document Type: Article |
Times cited : (13)
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References (30)
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