Impact of mask blank and mirror surface roughness on actinic EUVL mask blank inspection signal

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7028, Issue , 2008, Pages

  Yamane, Takeshi ^a   Tanaka, Toshihiko ^a   Terasawa, Tsuneo ^a   Suga, Osamu ^a   Tomie, Toshihisa ^b  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Actinic inspection; EUVL mask; Mask blank; Mirror; Phase defect; Roughness

Indexed keywords

COMPUTER NETWORKS; DEFECTS; DEGRADATION; ESTIMATION; EXTREME ULTRAVIOLET LITHOGRAPHY; FOURIER OPTICS; FRICTION; IMAGE ENHANCEMENT; INSPECTION; LIGHT; MASKS; METAL ANALYSIS; MIRRORS; OPTICAL TRANSFER FUNCTION; PHOTOACOUSTIC EFFECT; PHOTORESISTS; POWER SPECTRAL DENSITY; POWER SPECTRUM; PULSE SHAPING CIRCUITS; SODIUM; STEEL ANALYSIS; SULFATE MINERALS; SURFACE PROPERTIES; SURFACE ROUGHNESS; SURFACES; TECHNOLOGY;

(1 1 0) SURFACE; DEFECT IMAGING; DEFECT INSPECTION; DEGRADATION RATES; EXTREME ULTRAVIOLET LITHOGRAPHY (EUVL) MASKS; FOURIER TECHNIQUES; MASK BLANKS; MASK TECHNOLOGY; MAXIMUM INTENSITY; MIRROR SURFACE ROUGHNESS; MIRROR SURFACES; NEXT-GENERATION LITHOGRAPHY (NGL); PHOTO MASKING; POINT SPREAD FUNCTION (PSF); POWER SPECTRUM DENSITY (PSD); SCATTERED LIGHT; SIMULATED IMAGING; SPATIAL FREQUENCIES;

SURFACE DEFECTS;

EID: 45549086987     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.793070     Document Type: Conference Paper

References (9)

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