Material analysis with EUV/XUV radiation using a broadband laser plasma source and optics system

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7360, Issue , 2009, Pages

  Bayer, A ^a   Barkusky, F ^a   Dette, J O ^a   Doring S ^a   Floter B ^a   Peth, C ^a   Mann, K ^a  

^a LASER LABORATORIUM GÖTTINGEN E V   (Germany)

Author keywords

13.5nm; Adaptive flexible optics; Carbon K edge; EUV XUV; Kirkpatrick baez; Laser produced plasma (LPP); Material analysis; NEXAFS

Indexed keywords

13.5NM; ADAPTIVE/FLEXIBLE OPTICS; CARBON K-EDGE; EUV/XUV; KIRKPATRICK-BAEZ; LASER-PRODUCED PLASMA (LPP); MATERIAL ANALYSIS; NEXAFS;

ABSORPTION SPECTROSCOPY; GAS ABSORPTION; KRYPTON; LASER PRODUCED PLASMAS; LASERS; LIGHT; LIGHT REFLECTION; LITHOGRAPHY; OPTICAL COATINGS; OPTICAL MICROSCOPY; ORGANIC ACIDS; ORGANIC POLYMERS; PHOTORESISTS; PLASMA SOURCES; SEMICONDUCTING SILICON COMPOUNDS; SEMICONDUCTOR DEVICE MANUFACTURE; SEMICONDUCTOR LASERS; SILICON WAFERS; SUN; SURFACE ANALYSIS; TECHNOLOGICAL FORECASTING; ULTRAVIOLET DEVICES; X RAY ABSORPTION NEAR EDGE STRUCTURE SPECTROSCOPY; X RAY ANALYSIS; X RAY LITHOGRAPHY; X RAYS; XENON;

NEODYMIUM LASERS;

EID: 69949179138     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.822585     Document Type: Conference Paper

References (37)

1. A. Egbert et. al., Compact electron-based extreme ultraviolet source at 13.5 nm, J. Microlith. Microfab. Microsyst., 2 (2), 136-139, 2002.
2. V. Banine, R. Moors, Plasma sources for EUV lithography exposure tools, J. Phys. D: Appl. Phys., 37, 3207-3212, 2004.
3. T. Krücken et. al., Fundamentals and limits for the EUV emission of pinch plasma sources for EUV lithography, J. Phys. D: Appl. Phys., 37, 3213-3224, 2004.
4. K. Fahy et. al., UTA versus line emission for EUVL: studies on the Xenon emission at the NIST EBIT, J. Phys. D: Appl. Phys., 37, 3225-3232, 2004.
5. B. A. M. Hansson, H. M. Hertz, Liquid-jet laser-plasma extreme ultraviolet sources: from droplets to filaments, J. Phys. D: Appl. Phys., 37, 3233-3243, 2004.
6. U. Stamm, Extreme ultraviolet light sources for use in semiconductor industry - state of the art and future development, J. Phys. D: Appl. Phys., 37, 3244-3253, 2004.
7. V. M. Borisov et. al., EUV sources using Xe and Sn discharge plasmas, J. Phys. D: Appl. Phys., 37, 3254-3265, 2004.
8. I. V. Fomenkov et. al., EUV discharge light source based on a dense plasma focus operated with positive and negative polarity, J. Phys. D: Appl. Phys., 37, 3266-3276, 2004.
9. M. W. McGeoch, Pinch plasma EUV source with particle injection, J. Phys. D: Appl. Phys., 37, 3277-3284, 2004.
10. G. F. Cardinale et. al., Effects of smoothing on defect printability at extreme ultraviolet wavelengths, J. Vac. Sci. Technol. B, 18 (6), 2944-2949, 2000.
11. H. N. Chapman et. al., First lithographic results from the extreme ultraviolet Engineering Test Stand, J. Vac. Sci. Technol. B, 19 (6), 2389-2395, 2001.
12. M. F. Bal, M. Singh, J. J. M. Braat, Optimization of multilayer reflectors for extreme ultraviolet lithography, J. Microlith. Microfab. Microsyst., 3 (4), 537-544, 2004.
13. G. Baldacchini, F. Bonfigli et. al., Luminescent patterns based on color centers generated in lithium fluoride by extreme ultraviolet radiation and soft X-rays, Rad. Eff. & Def. in Sol., 157, 567-573, 2002.
14. E. Nichelatti et. al., Surface generation of color centers in lithium fluoride by EUV-irradiation, J. Non-Cryst. Sol., 351, 1774-1779, 2005.
15. F. Bonfigli et. al., Point defects in lithium fluoride films for micro-radiography, X-ray microscopy and photonic applications, phys. stat. sol. (a), 202 (2), 250-255, 2005.
16. G. Baldacchini, F. Bonfigli et. al., High-contrast photoluminscent patterns in lithium fluoride crystals produced by soft X-rays from a laser-plasma source, Appl. Phys. Lett., 80 (25), 4810-4812, 2002.
17. Hongen Gu & Lan Qi, Opt. Comm. 210, 299-303, 2002.
18. Hongen Gu & Honghai Liu, Opt. Comm. 201, 113-116, 2002.
19. E. J. Caine & S. D. Miller, J. Vac. Sci. Technol. B, 16 (6), 3232 1998.
20. G. Tomassetti et. al., High-resolution imaging of a soft-X-ray laser beam by color centers excitation in lithium fluoride crystals, Europhys. Lett., 63 (5), 681-686, 2003.
21. Baldacchini G. & Bonfigli F. et. al., J. Nanosc. a. Nanotechn., 3, 483-486, 2003.
22. Baldacchini G. & Bollanti S. et. al., IEEE J. of Sel. Top. in Quant. El., 10, 1435-1445, 2004.
23. S. Tascu et. al., Near field optical spectroscopy of colored centers stripes written in lithium fluoride by electronbeam lithography, Rad. Eff. & Def. in Sol., 157, 691-694, 2002.
24. 2 color center spatial distribution on the emission properties of optical microcavities based on LiF films, Rad. Eff. & Def. in Sol., 158, 185-190, 2003.
25. K. Kawamura & T. Kurobori et.al., Femtosecond-laser-encoded distributed-feedback color center laser in lithium fluoride single crystals, Appl. Phys. Lett., 83 (3), 311-313, 2004.
26. T. Kurobori et. al., Application of wide-band-gap materials for optoelectronic functional devices fabricated by a pair of interfering femtosecond laser pulses, Jap. J. Appl. Phys., 44 (2), 910-913, 2005.
27. F. Barkusky, A. Bayer, C. Peth, K. Mann: Direct Photo-Etching of PMMA by Focused EUV Radiation From a Compact Laser Plasma Source, Proc. of SPIE, 6879, 6879-6939 (2008).
28. F. Barkusky, C. Peth, A. Bayer, K. Mann: Direct photo-etching of poly(methyl methacrylate) using focused extreme ultraviolet radiation from a table-top laser-induced plasma source, J. Appl. Phys. 101, 124908 (2007).
29. F. Barkusky, A. Bayer, C. Peth, H. Töttger, K. Mann: Compact EUV source and Schwarzschild objective for modification and ablation of various materials, SPIE Europe, Proc. Of SPIE, Vol. 6586, 6586-10 (2007).
30. David Attwood; "Soft X-rays and Extreme Ultraviolet Radiation - Principles and Applications", Cambridge University Press, 1999; ISBN 0 521 65214 6.
31. S. Kranzusch, K. Mann, Opt. Comm., 200, 223-230, 2001.
32. C. Peth, S. Kranzusch, K. Mann, W. Viöl, Rev. Sci. Instrum., 75 (10), 3288-3293, 2004.
33. S. Kranzusch, C. Peth, K. Mann, Rev. Sci. Instrumm., 72 (2), 969-974, 2003.
34. V. Banine, R. Moors, J. Phys. D: Appl. Phys., 37, 3207-3212, 2004.
35. P. P. Naulleau et.a, Tolerancing of diffraction-limited Kirkpatrick-Baez synchrotron beamline optics for extreme ultraviolet metrology, Appl. Opt., 40 (22), 3703-3709, 2001.
36. NIST Atomic Spectra Database.
37. J. L. Jordan-Sweet, C. A. Kovac, M. J. Goldberg et al., J. Chem. Phys., 89, 4 (1988).