Compact electron-based extreme ultraviolet source at 13.5 nm

Journal of Microlithography, Microfabrication and Microsystems

Volumn 2, Issue 2, 2003, Pages 136-139

  Egbert, A ^a   Mader, B ^a   Tkachenko, A ^a   Ostendorf, A ^a   Fallnich, C ^a   Chichkov, B N ^a   Mialla, T ^b   Schurmann M C ^b   Gabel K ^c   Schriever, G ^c   Stamm, U ^c  

^a LASER ZENTRUM HANNOVER E V   (Germany)

^b Jenoptik Mikrotechnik   (Germany)

^c XTREME Technologies GmbH   (Germany)

Author keywords

Extreme ultraviolet; Lithography; Metrology; Targets

Indexed keywords

EID: 1942435856     PISSN: 15371646     EISSN: None     Source Type: Journal    
DOI: 10.1117/1.1532350     Document Type: Article

References (7)

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