-
2
-
-
13444270826
-
Wet etching of GaN, AlN, and SiC: A review
-
DOI 10.1016/j.mser.2004.11.002, PII S0927796X04001251
-
D. Zhuang and J. H. Edgar, Mater. Sci. Eng. R. 0927-796X, 48, 1 (2005). 10.1016/j.mser.2004.11.002 (Pubitemid 40211034)
-
(2005)
Materials Science and Engineering R: Reports
, vol.48
, Issue.1
-
-
Zhuang, D.1
Edgar, J.H.2
-
3
-
-
0033285508
-
Photoenhanced wet chemical etching of MBE grown gallium nitride
-
DOI 10.1016/S0921-5107(99)00416-X
-
N. M. Stanton, A. J. Kent, P. Hawker, T. S. Cheng, C. T. Foxon, D. Korakakis, R. P. Campion, C. R. Staddon, and J. R. Middleton, Mater. Sci. Eng., B 0921-5107, 68, 52 (1999). 10.1016/S0921-5107(99)00416-X (Pubitemid 32083266)
-
(1999)
Materials Science and Engineering B: Solid-State Materials for Advanced Technology
, vol.68
, Issue.1
, pp. 52-55
-
-
Stanton, N.M.1
Kent, A.J.2
Hawker, P.3
Cheng, T.S.4
Foxon, C.T.5
Korakakis, D.6
Campion, R.P.7
Staddon, C.R.8
Middleton, J.R.9
-
4
-
-
0035441558
-
Photoenhanced wet etching of gallium nitride in KOH-based solutions
-
DOI 10.1116/1.1395615
-
J. Skriniarova, P. Bochem, A. Fox, and P. Kordos, J. Vac. Sci. Technol. B 1071-1023, 19, 1721 (2001). 10.1116/1.1395615 (Pubitemid 33008414)
-
(2001)
Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures
, vol.19
, Issue.5
, pp. 1721-1727
-
-
Skriniarova, J.1
Bochem, P.2
Fox, A.3
Kordos, P.4
-
6
-
-
0030103958
-
Room-temperature photoenhanced wet etching of GaN
-
DOI 10.1063/1.115689, PII S0003695196042118
-
M. S. Minsky, M. White, and E. L. Hu, Appl. Phys. Lett. 0003-6951, 68, 1531 (1996). 10.1063/1.115689 (Pubitemid 126688306)
-
(1996)
Applied Physics Letters
, vol.68
, Issue.11
, pp. 1531-1533
-
-
Minsky, M.S.1
White, M.2
Hu, E.L.3
-
7
-
-
0001069324
-
-
0003-6951, 10.1063/1.119365
-
C. Youtsey, I. Adesida, and G. Bulman, Appl. Phys. Lett. 0003-6951, 71, 2151 (1997). 10.1063/1.119365
-
(1997)
Appl. Phys. Lett.
, vol.71
, pp. 2151
-
-
Youtsey, C.1
Adesida, I.2
Bulman, G.3
-
8
-
-
0032472665
-
Smooth n-type GaN surfaces by photoenhanced wet etching
-
DOI 10.1063/1.120758, PII S0003695198013059
-
C. Youtsey, I. Adesida, L. T. Romano, and G. Bulman, Appl. Phys. Lett. 0003-6951, 72, 560 (1998). 10.1063/1.120758 (Pubitemid 128671240)
-
(1998)
Applied Physics Letters
, vol.72
, Issue.5
, pp. 560-562
-
-
Youtsey, C.1
Adesida, I.2
Romano, L.T.3
Bulman, G.4
-
9
-
-
0000100859
-
Gallium nitride whiskers formed by selective photoenhanced wet etching of dislocations
-
DOI 10.1063/1.122005, PII S0003695198029325
-
C. Youtsey, L. T. Romano, and I. Adesida, Appl. Phys. Lett. 0003-6951, 73, 797 (1998). 10.1063/1.122005 (Pubitemid 128673920)
-
(1998)
Applied Physics Letters
, vol.73
, Issue.6
, pp. 797-799
-
-
Youtsey, C.1
Romano, L.T.2
Adesida, I.3
-
10
-
-
0001051542
-
-
0003-6951, 10.1063/1.1318726
-
A. R. Stonas, P. Kozodoy, H. Marchand, P. Fini, S. P. DenBaars, U. K. Mishra, and E. L. Hu, Appl. Phys. Lett. 0003-6951, 77, 2610 (2000). 10.1063/1.1318726
-
(2000)
Appl. Phys. Lett.
, vol.77
, pp. 2610
-
-
Stonas, A.R.1
Kozodoy, P.2
Marchand, H.3
Fini, P.4
Denbaars, S.P.5
Mishra, U.K.6
Hu, E.L.7
-
11
-
-
10644260341
-
-
0022-0248, 10.1016/j.jcrysgro.2004.09.029
-
L. Macht, J. J. Kelly, J. L. Weyher, A. Grzegorczyk, and P. K. Larsen, J. Cryst. Growth 0022-0248, 273, 347 (2005). 10.1016/j.jcrysgro.2004.09.029
-
(2005)
J. Cryst. Growth
, vol.273
, pp. 347
-
-
MacHt, L.1
Kelly, J.J.2
Weyher, J.L.3
Grzegorczyk, A.4
Larsen, P.K.5
-
12
-
-
56749159717
-
-
0013-4651, 10.1149/1.3005978
-
A. C. Tamboli, M. C. Schmidt, S. Rajan, J. S. Speck, U. K. Mishra, S. P. DenBaars, and E. L. Hu, J. Electrochem. Soc. 0013-4651, 156, H47 (2009). 10.1149/1.3005978
-
(2009)
J. Electrochem. Soc.
, vol.156
, pp. 47
-
-
Tamboli, A.C.1
Schmidt, M.C.2
Rajan, S.3
Speck, J.S.4
Mishra, U.K.5
Denbaars, S.P.6
Hu, E.L.7
-
13
-
-
0033354789
-
-
0361-5235, 10.1007/s11664-999-0254-0
-
J. A. Bardwell, I. G. Foulds, J. B. Webb, H. Tang, J. Fraser, S. Moisa, and S. J. Rolfe, J. Electron. Mater. 0361-5235, 28, L24 (1999). 10.1007/s11664-999-0254-0
-
(1999)
J. Electron. Mater.
, vol.28
, pp. 24
-
-
Bardwell, J.A.1
Foulds, I.G.2
Webb, J.B.3
Tang, H.4
Fraser, J.5
Moisa, S.6
Rolfe, S.J.7
-
14
-
-
0000008175
-
-
0003-6951, 10.1063/1.1330226
-
H. Maher, D. W. DiSanto, G. Soerensen, C. R. Bolognesi, H. Tang, and J. B. Webb, Appl. Phys. Lett. 0003-6951, 77, 3833 (2000). 10.1063/1.1330226
-
(2000)
Appl. Phys. Lett.
, vol.77
, pp. 3833
-
-
Maher, H.1
Disanto, D.W.2
Soerensen, G.3
Bolognesi, C.R.4
Tang, H.5
Webb, J.B.6
-
15
-
-
0035309259
-
-
0021-8979, 10.1063/1.1352684
-
J. A. Bardwell, J. B. Webb, H. Tang, J. Fraser, and S. Moisa, J. Appl. Phys. 0021-8979, 89, 4142 (2001). 10.1063/1.1352684
-
(2001)
J. Appl. Phys.
, vol.89
, pp. 4142
-
-
Bardwell, J.A.1
Webb, J.B.2
Tang, H.3
Fraser, J.4
Moisa, S.5
-
16
-
-
2942552927
-
-
0003-6951, 10.1063/1.1737799
-
Z. H. Hwang, J. M. Hwang, H. L. Hwang, and W. H. Hung, Appl. Phys. Lett. 0003-6951, 84, 3759 (2004). 10.1063/1.1737799
-
(2004)
Appl. Phys. Lett.
, vol.84
, pp. 3759
-
-
Hwang, Z.H.1
Hwang, J.M.2
Hwang, H.L.3
Hung, W.H.4
-
17
-
-
0037402015
-
-
0038-1098, 10.1016/S0038-1098(03)00130-3
-
T. L. Rittenhouse, P. W. Bohn, and I. Adesida, Solid State Commun. 0038-1098, 126, 245 (2003). 10.1016/S0038-1098(03)00130-3
-
(2003)
Solid State Commun.
, vol.126
, pp. 245
-
-
Rittenhouse, T.L.1
Bohn, P.W.2
Adesida, I.3
-
18
-
-
0036883102
-
-
1071-1023, 10.1116/1.1521428
-
D. J. Diaz, T. L. Williamson, I. Adesida, P. W. Bohn, and R. J. Molnar, J. Vac. Sci. Technol. B 1071-1023, 20, 2375 (2002). 10.1116/1.1521428
-
(2002)
J. Vac. Sci. Technol. B
, vol.20
, pp. 2375
-
-
Diaz, D.J.1
Williamson, T.L.2
Adesida, I.3
Bohn, P.W.4
Molnar, R.J.5
-
19
-
-
0346907157
-
-
0021-8979, 10.1063/1.1628833
-
D. J. Diaz, T. L. Williamson, I. Adesida, P. W. Bohn, and R. J. Molnar, J. Appl. Phys. 0021-8979, 94, 7526 (2003). 10.1063/1.1628833
-
(2003)
J. Appl. Phys.
, vol.94
, pp. 7526
-
-
Diaz, D.J.1
Williamson, T.L.2
Adesida, I.3
Bohn, P.W.4
Molnar, R.J.5
-
20
-
-
84974805031
-
-
0013-4651, 10.1149/1.2412052
-
R. Memming, J. Electrochem. Soc. 0013-4651, 116, 785 (1969). 10.1149/1.2412052
-
(1969)
J. Electrochem. Soc.
, vol.116
, pp. 785
-
-
Memming, R.1
-
21
-
-
0024034903
-
ELECTROLUMINESCENCE AT THE SiC/ELECTROLYTE INTERFACE.
-
DOI 10.1016/0022-2313(88)90064-6
-
A. Manivannan and A. Fujishima, J. Lumin. 0022-2313, 42, 43 (1988). 10.1016/0022-2313(88)90064-6 (Pubitemid 18652912)
-
(1988)
Journal of Luminescence
, vol.42
, Issue.1
, pp. 43-47
-
-
Manivannan, A.1
Fujishima, A.2
-
22
-
-
0025502956
-
-
0013-4651, 10.1149/1.2086170
-
A. Manivannan, K. Itoh, K. Hashimoto, T. Sakata, and A. Fujishima, J. Electrochem. Soc. 0013-4651, 137, 3121 (1990). 10.1149/1.2086170
-
(1990)
J. Electrochem. Soc.
, vol.137
, pp. 3121
-
-
Manivannan, A.1
Itoh, K.2
Hashimoto, K.3
Sakata, T.4
Fujishima, A.5
-
23
-
-
0142116360
-
-
0013-4651, 10.1149/1.1603251
-
I. M. Huygens, W. P. Gomes, A. Theuwis, and K. Strubbe, J. Electrochem. Soc. 0013-4651, 150, G602 (2003). 10.1149/1.1603251
-
(2003)
J. Electrochem. Soc.
, vol.150
, pp. 602
-
-
Huygens, I.M.1
Gomes, W.P.2
Theuwis, A.3
Strubbe, K.4
-
24
-
-
0032164993
-
-
1099-0062, 10.1149/1.1390664
-
C. J. Hung, L. I. Halaoui, A. J. Bard, P. A. Grudowski, R. D. Dupuis, J. Molstad, and F. J. DiSalvo, Electrochem. Solid-State Lett. 1099-0062, 1, 142 (1998). 10.1149/1.1390664
-
(1998)
Electrochem. Solid-State Lett.
, vol.1
, pp. 142
-
-
Hung, C.J.1
Halaoui, L.I.2
Bard, A.J.3
Grudowski, P.A.4
Dupuis, R.D.5
Molstad, J.6
Disalvo, F.J.7
-
25
-
-
0033738705
-
Electrochemistry and photoetching of n-GaN
-
DOI 10.1149/1.1393436
-
I. M. Huygens, K. Strubbe, and W. P. Gomes, J. Electrochem. Soc. 0013-4651, 147, 1797 (2000). 10.1149/1.1393436 (Pubitemid 30868662)
-
(2000)
Journal of the Electrochemical Society
, vol.147
, Issue.5
, pp. 1797-1802
-
-
Huygens, I.M.1
Strubbe, K.2
Gomes, W.P.3
-
27
-
-
0029491214
-
-
0013-4651, 10.1149/1.2048511
-
S. S. Kocha, M. W. Peterson, D. J. Arent, J. M. Redwing, M. A. Tischler, and J. A. Turner, J. Electrochem. Soc. 0013-4651, 142, L238 (1995). 10.1149/1.2048511
-
(1995)
J. Electrochem. Soc.
, vol.142
, pp. 238
-
-
Kocha, S.S.1
Peterson, M.W.2
Arent, D.J.3
Redwing, J.M.4
Tischler, M.A.5
Turner, J.A.6
-
28
-
-
0000703437
-
-
0003-6951, 10.1063/1.126822
-
T. Rotter, D. Mistele, J. Stemmer, F. Fedler, J. Aderhold, J. Graul, V. Schwegler, C. Kirchner, M. Kamp, and M. Heuken, Appl. Phys. Lett. 0003-6951, 76, 3923 (2000). 10.1063/1.126822
-
(2000)
Appl. Phys. Lett.
, vol.76
, pp. 3923
-
-
Rotter, T.1
Mistele, D.2
Stemmer, J.3
Fedler, F.4
Aderhold, J.5
Graul, J.6
Schwegler, V.7
Kirchner, C.8
Kamp, M.9
Heuken, M.10
-
30
-
-
15744373835
-
Statistical photoluminescence of dislocations and associated defects in heteroepitaxial GaN grown by metal organic chemical vapor deposition
-
DOI 10.1103/PhysRevB.71.073309, 073309
-
L. Macht, J. L. Weyher, A. Grzegorczyk, and P. K. Larsen, Phys. Rev. B 0163-1829, 71, 073309 (2005). 10.1103/PhysRevB.71.073309 (Pubitemid 40416733)
-
(2005)
Physical Review B - Condensed Matter and Materials Physics
, vol.71
, Issue.7
, pp. 1-4
-
-
Macht, L.1
Weyher, J.L.2
Grzegorczyk, A.3
Larsen, P.K.4
-
31
-
-
33847093358
-
Fabry-Perot effects in InGaNGaN heterostructures on Si-substrate
-
DOI 10.1063/1.2434010
-
C. Hums, T. Finger, T. Hempel, J. Christen, A. Dadgar, A. Hoffmann, and A. Krost, J. Appl. Phys. 0021-8979, 101, 033113 (2007). 10.1063/1.2434010 (Pubitemid 46280812)
-
(2007)
Journal of Applied Physics
, vol.101
, Issue.3
, pp. 033113
-
-
Hums, C.1
Finger, T.2
Hempel, T.3
Christen, J.4
Dadgar, A.5
Hoffmann, A.6
Krost, A.7
-
32
-
-
0034155668
-
Fabrication of high performance GaN modulation doped field effect transistors
-
DOI 10.1116/1.582172
-
J. A. Bardwell, I. Foulds, B. Lamontagne, H. Tang, J. B. Webb, P. Marshall, S. J. Rolfe, J. Stapledon, and T. W. MacElwee, J. Vac. Sci. Technol. A 0734-2101, 18, 750 (2000). 10.1116/1.582172 (Pubitemid 30896898)
-
(2000)
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
, vol.18
, Issue.2
, pp. 750-753
-
-
Bardwell, J.A.1
Foulds, I.2
Lamontagne, B.3
Tang, H.4
Webb, J.B.5
Marshall, P.6
Rolfe, S.J.7
Stapledon, J.8
MacElwee, T.W.9
-
33
-
-
0035894148
-
Selective photoetching and transmission electron microscopy studies of defects in heteroepitaxial GaN
-
DOI 10.1063/1.1416137
-
J. L. Weyher, F. D. Tichelaar, H. W. Zandbergen, L. Macht, and P. R. Hageman, J. Appl. Phys. 0021-8979, 90, 6105 (2001). 10.1063/1.1416137 (Pubitemid 34046765)
-
(2001)
Journal of Applied Physics
, vol.90
, Issue.12
, pp. 6105
-
-
Weyher, J.L.1
Tichelaar, F.D.2
Zandbergen, H.W.3
Macht, L.4
Hageman, P.R.5
-
34
-
-
0033339264
-
-
0021-4922, 10.1143/JJAP.38.L1159
-
A. Watanabe, H. Takahashi, T. Tanaka, H. Ota, K. Chikuma, H. Amano, T. Kashima, R. Nakamura, and I. Akasaki, Jpn. J. Appl. Phys., Part 2 0021-4922, 38, L1159 (1999). 10.1143/JJAP.38.L1159
-
(1999)
Jpn. J. Appl. Phys., Part 2
, vol.38
, pp. 1159
-
-
Watanabe, A.1
Takahashi, H.2
Tanaka, T.3
Ota, H.4
Chikuma, K.5
Amano, H.6
Kashima, T.7
Nakamura, R.8
Akasaki, I.9
-
35
-
-
0033803773
-
-
0897-4756, 10.1021/cm9912066
-
X. H. Xia, C. M. A. Ashruf, P. J. French, and J. J. Kelly, Chem. Mater. 0897-4756, 12, 1671 (2000). 10.1021/cm9912066
-
(2000)
Chem. Mater.
, vol.12
, pp. 1671
-
-
Xia, X.H.1
Ashruf, C.M.A.2
French, P.J.3
Kelly, J.J.4
-
36
-
-
0011787882
-
-
1530-437X, 10.1109/JSEN.2001.936930
-
J. J. Kelly, X. H. Xia, C. M. A. Ashruf, and P. J. French, IEEE Sens. J. 1530-437X, 1, 127 (2001). 10.1109/JSEN.2001.936930
-
(2001)
IEEE Sens. J.
, vol.1
, pp. 127
-
-
Kelly, J.J.1
Xia, X.H.2
Ashruf, C.M.A.3
French, P.J.4
|