Photoinduced oxide film formation on n-type GaN surfaces using alkaline solutions

Applied Physics Letters

Volumn 76, Issue 26, 2000, Pages 3923-3925

  Rotter, T ^a   Mistele, D ^a   Stemmer, J ^a   Fedler, F ^a   Aderhold, J ^a   Graul, J ^a   Schwegler, V ^b   Kirchner, C ^b   Kamp, M ^b   Heuken, M ^c  

^a LEIBNIZ UNIVERSITY HANNOVER   (Germany)

^b UNIVERSITY OF ULM   (Germany)

^c AIXTRON AG   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000703437     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.126822     Document Type: Article

References (25)

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