Photoenhanced wet etching of gallium nitride in KOH-based solutions

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 19, Issue 5, 2001, Pages 1721-1727

  Skriniarova J ^a,b   Bochem, P ^a   Fox, A ^a   Kordos P ^a  

^a FORSCHUNGSZENTRUM JÜLICH   (Germany)

^b SLOVAK UNIVERSITY OF TECHNOLOGY   (Slovakia)

Author keywords

[No Author keywords available]

Indexed keywords

ETCHING; PHOTOCURRENTS; POTASSIUM COMPOUNDS; SUBSTRATES; SURFACE ROUGHNESS;

PHOTOELECTROCHEMICAL ETCHING; WET ETCHING;

GALLIUM NITRIDE;

EID: 0035441558     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1395615     Document Type: Article

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