Controlled fabrication of nanopit patterns on a graphite surface using focused ion beams and oxidation

Journal of Applied Physics

Volumn 101, Issue 4, 2007, Pages

  Ghaleh, F ^a   Koster R ^a   Hovel H ^a   Bruchhaus, L ^b   Bauerdick, S ^b   Thiel, J ^b   Jede, R ^b  

^a TU DORTMUND UNIVERSITY   (Germany)

^b RAITH GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON IRRADIATION; ELECTROOXIDATION; FOCUSED ION BEAMS; GRAPHITE; SCANNING TUNNELING MICROSCOPY; SUBSTRATES;

GRAPHITE SUBSTRATES; ION DOSES; NANOPIT PATTERNS; SURFACE OXIDATION;

NANOTECHNOLOGY;

EID: 33847619730     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2450677     Document Type: Article

References (22)

1. J. Gierak, Appl. Phys. A: Mater. Sci. Process. A80, 187 (2005).
2. S. Matsui and Y. Ochiai, Nanotechnology 7, 247 (1996).
3. K. A. Lister, S. Thoms, D. S. Macintyre, C. D. W. Wilkinson, J. M. R. Weaver, and B. G. Casey, J. Vac. Sci. Technol. B 22, 3257 (2004).
4. C. Binns, F. Sirotti, H. Cruguel, S. H. Baker, P. Prieto, J. D. Bellier, and S. C. Thornton, J. Phys.: Condens. Matter 15, 4287 (2003).
5. T. Gleitsmann, B. Stegemann, and T. M. Bernhardt, Appl. Phys. Lett. 84, 4050 (2004).
6. H. Hövel, Th. Becker, A. Bettac, B. Reihl, M. Tschudy, and E. J. Williams, J. Appl. Phys. 81, 154 (1997).
7. H. Hövel, Appl. Phys. A: Mater. Sci. Process. 72, 295 (2001).
8. Y.-J. Zhu, A. Schneiders, J. D. Alexander, and T. P. Beebe, Langmuir 18, 5728 (2002).
9. Project supported by European Comission (G5RD-CT2000-0034); http://www.nanofib.com
10. Project supported by European Comission (G5RD-CT2000-0034); http://www.nanofib.com
11. V. E. Krohn and G. R. Ringo, Appl. Phys. Lett. 27, 479 (1975).
12. L. W. Swanson, G. A. Schwind, and A. E. Bell, J. Appl. Phys. 51, 3453 (1980).
13. R. G. Forbes, Vacuum 48, 85 (1997).
14. V. E. Krohn, J. Appl. Phys. 45, 1144 (1974).
15. R. L. Seliger, J. W. Ward, V. Wang, and R. L. Kubena, Appl. Phys. Lett. 34, 310 (1979).
16. X. Chu and L. D. Schmidt, Surf. Sci. 268, 325 (1992).
17. T. Becker, H. Hövel, M. Tschudy, and B. Reihl, Appl. Phys. A: Mater. Sci. Process. A66, S27 (1998).
18. R. T. Yang and C. Wong, J. Chem. Phys. 75, 4471 (1981).
19. E. L. Evans, R. J. M. Griffiths, and J. M. Thomas, Science 171, 174 (1971).
20. G. Bräuchle, S. Richard-Schneider, D. Illig, J. Rockenberger, R. D. Beck, and M. M. Kappes, Appl. Phys. Lett. 67, 52 (1995).
21. L. Seminara, P. Convers, R. Monot, and W. Harbich, Eur. Phys. J. D 29, 49 (2004).
22. Y.-J. Zhu, T. A. Hansen, S. Ammermann, J. D. McBride, and T. P. Beebe, J. Phys. Chem. B 105, 7632 (2001).