Spectroscopic ellipsometry of very thin tantalum pentoxide on Si

Applied Surface Science

Volumn 255, Issue 22, 2009, Pages 9211-9216

  Karmakov, I ^a   Konova, A ^a   Atanassova, E ^b   Paskaleva, A ^b  

^a UNIVERSITY OF SOFIA   (Bulgaria)

^b INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

Author keywords

Algorithm; Constituents; Depth profile; High k; Spectroscopic ellipsometry; T 2 O 5 Si

Indexed keywords

ALGORITHMS; DEPTH PROFILING; TANTALUM OXIDES;

CONSTITUENTS; DATA INTERPRETATION; HIGH- K; QUANTITATIVE DETERMINATIONS; SIMULATION PROCEDURES; T2O5/SI; TANTALUM PENTOXIDE; VARIABLE ANGLE SPECTROSCOPIC ELLIPSOMETRY;

SPECTROSCOPIC ELLIPSOMETRY;

EID: 68649097114     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.07.014     Document Type: Article

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