Uniformity of optical constants in amorphous Ta2O5 thin films as measured by spectroscopic ellipsometry

Russian Microelectronics

Volumn 33, Issue 5, 2004, Pages 285-291

  Shvets, V A ^a   Gritsenko, D V ^b   Aliev, V Sh ^a   Chikichev, S I ^a,b   Rykhlitskii, S V ^a  

^a INSTITUTE OF SEMICONDUCTOR PHYSICS   (Russian Federation)

^b NOVOSIBIRSK STATE UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC FORCE MICROSCOPY; ELLIPSOMETRY; ENERGY GAP; OPTICAL FILTERS; RANDOM ACCESS STORAGE; REFRACTIVE INDEX; SEMICONDUCTING SILICON; SPECTROSCOPIC ANALYSIS; SURFACE ROUGHNESS; THIN FILMS;

OPTICAL CONSTANTS; REACTIVE SPUTTERING; SPECTROSCOPIC ELLIPSOMETRY; WAVELENGTHS;

TANTALUM COMPOUNDS;

EID: 5444221962     PISSN: 10637397     EISSN: None     Source Type: Journal    
DOI: 10.1023/B:RUMI.0000043044.12580.1e     Document Type: Article

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