Characteristics of interface between Ta2O5 thin film and Si (100) substrate

Surface and Coatings Technology

Volumn 200, Issue 5-6, 2005, Pages 1714-1718

  Huang, A P ^a   Chu, Paul K ^a  

^a CITY UNIVERSITY OF HONG KONG   (Hong Kong)

Author keywords

Dielectric; Sputtering; Substrate bias; Ta2O5

Indexed keywords

DEPOSITION; DIELECTRIC PROPERTIES; INTERFACES (MATERIALS); MAGNETRON SPUTTERING; SILICON WAFERS; SUBSTRATES; THIN FILMS;

INTERFACIAL LAYER; SUBSTRATE BIAS; TANTALUM PENTOXIDE;

TANTALUM COMPOUNDS;

COATING;

EID: 28844438385     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2005.08.082     Document Type: Article

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