Composition of Ta 2 O 5 stacked films on N 2 O- and NH 3 -nitrided Si

Applied Surface Science

Volumn 253, Issue 5, 2006, Pages 2841-2851

  Atanassova, E ^a   Spassov, D ^a   Paskaleva, A ^a   Kostov, K ^b  

^a INSTITUTE OF SOLID STATE PHYSICS   (Bulgaria)

^b INSTITUTE OF GENERAL AND INORGANIC CHEMISTRY   (Bulgaria)

Author keywords

Depth profiles; Silicon nitridation; Tantalum pentoxide; XPS

Indexed keywords

INTERFACES (MATERIALS); OXIDATION; SILICATES; SURFACE STRUCTURE; TANTALUM COMPOUNDS; X RAY PHOTOELECTRON SPECTROSCOPY;

DEPTH PROFILES; NITRIDATION GAS; SILICON NITRIDATION; TANTALUM PENTOXIDE;

THIN FILMS;

EID: 33751406026     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2006.05.116     Document Type: Article

References (41)

1. Intern. Techn. Roadmap for Semicond. http://public.itrs.net/.
2. Wallace R.M., and Wilk G. Alternative gate dielectrics for microelectronics. MRS Bull. 27 (2002)
3. Atanassova E. Microel. Reliab. 39 (1999) 1185
4. Atanassova E., and Dimitrova T. In: Nalva H.S. (Ed). Handbook of Surfaces and Interfaces of Materials vol. 4 (2001), Academic Press, San Diego, CA, USA 439
5. Wilk G.D., Wallace R.M., and Anthony J.M. J. Appl. Phys. 89 (2001) 5243
6. Schlom D.G. J. Mater. Res. 11 (1996) 2757
7. Alers G.B., Werder D.J., Chabal Y., Lu H.C., Gusev E.P., Garfunkel E., Gustafsson T., and Urdahl R.S. Appl. Phys. Lett. 73 (1998) 1517
8. Gusev E.P., Copel M., Cartier E., Baumvol I.J., Krug C., and Gribelyuk M.A. Appl. Phys. Lett. 76 (2000) 176
9. Busch B.W., Kwo J., Hong M., Mannaerts J.P., Sapjeta B.J., Schulte W.H., Carfunkel E., and Gustafsson T. Appl. Phys. Lett. 79 (2001) 2447
10. Lucovsky G., Whitten J.L., and Zhang Y. Microelectron. Eng. 59 (2001) 329
11. Passacantando M., Jolly E., Lozzi L., Salerni V., Picozzi P., Santucci S., Corsi C., and Zintu D. J. Non-Cryst. Solids 322 (2003) 225
12. Atanassova E., Novkovski N., Paskaleva A., and Pecovska M. Solid State Electron. 46 (2002) 1887
13. Atanassova E., Kalitzova M., Zollo G., Paskaleva A., Peeva A., Georgieva M., and Vitali G. Thin Solid Films 426 (2003) 191
14. Spassov D., Atanassova E., and Virovska D. Appl. Phys. A 82 (2006) 55
15. Hollaway P.H., and Nelson G.S. J. Vac. Sci. Technol. 16 (1979) 793
16. Sanz J.M., and Hofmann S. Surf. Interface Anal. 5 (1983) 210
17. Rossnagel S.M., and Sites J.R. J. Vac. Sci. Technol. A2 (1984) 376
18. Atanassova E., and Spassov D. Appl. Surf. Sci. 135 (1998) 71
19. Atanassova E., Tyuliev G., Paskaleva A., Spassov D., and Kostov K. Appl. Surf. Sci. 225 (2004) 86
20. Sobolewski M.A., and Helms C.R. J. Vac. Sci. Technol. A6 (1988) 1358
21. Muto A., Yano F., Sugawara Y., and Iijima S. Jpn. J. Appl. Phys. 33 (1994) 2699
22. Kuo Y. J. Electrochem. Soc. 139 (1992) 579
23. Chang J.P., Opila R.L., Alers G.B., Steigerwald M.L., Lu H.C., Garfunkel E., and Gustafsson T. Solid State Technol. 42 (1999) 43
24. Vincent Crist B. Handbook of the Elements and Native Oxides (1999), XPS Intern. Inc., Kamiasao Asao-ku, Kawasaki Japan
25. In: Briggs D., and Seach M.P. (Eds). Practical Surface Analysis by Auger and X-ray Photoelectron Spectroscopy (1983), Wiley, New York
26. Iwata S., and Ishizaka A. J. Appl. Phys. 79 (1996) 6653
27. Grunthaner F.J., Lewis B.F., Zannini N., Masrdjian J., and Madhukar A. IEEE Trans. Nucl. Sci. 27 (1980) 1640
28. Takayama N., Noya A., Sase T., Ohta A., and Sasari K. J. Vac. Sci. Technol. 14 (1996) 674
29. Alfonsetti R., De Simone G., Lozzi L., Passacantando M., Picozzi P., and Santucci S. Surf. Interface Anal. 22 (1994) 89
30. Takano I., Isobe S., Sasaki T.A., and Baba Y. Appl. Surf. Sci. 37 (1989) 25
31. Oehrlein G.S., and Reisman A. J. Appl. Phys. 54 (1983) 6502
32. Wagner G.D., Riggs W.M., Davis L.E., and Moulder J.F. Handbook of X-ray Photoelectron Spectroscopy (1979), Perkin-Elmer, USA
33. Zhao X., Magtoto N.P., and Kelber J.A. Thin Solid Films 478 (2005) 188
34. Bouvet D., Clivaz P.A., Dutoit M., Coluzza C., Almeida J., Margaritondo G., and Pio F. J. Appl. Phys. 79 (1996) 7114
35. Hegde R.I., Tobin P.J., Reid K.G., Maiti B., and Ajuria S.A. Appl. Phys. Lett. 66 (1995) 2882
36. Lai Y.-S., Chen J.S., and Wang J.L. J. Electrochem. Soc. 151 (2004) F135
37. Moulder J.F., Stickle W.F., Sobol P.F., and Bomben K.D. Handbook of X-ray Photoelctron Spectroscopy (1995), Physical Electronics Inc., Eden, Prairie, MN
38. Ingo G.M., Zacchetti N., della Sala D., and Coluzza C. J. Vac. Sci. Technol 7 (1989) 3048
39. Ganem J.J., Rigo S., Trimaille I., Lu G.N., Dufour G., and Roulet H. Nucl. Instrum. Methods, Phys. Rev. B64 (1992) 744
40. Saoudi R., Hollinger G., Gagnaire A., Pitaval M., and Molle P. J. Phys. III 5 (1995) 557
41. Shinagawa S., Nohira H., Ikuta T., Hori M., Kase M., and Hattori T. Microelectron. Eng. 80 (2005) 98