Effects of high-temperature annealing on the dielectric function of Ta2O5 films observed by spectroscopic ellipsometry

Applied Physics Letters

Volumn 77, Issue 19, 2000, Pages 3012-3014

  Nguyen, N V ^a   Richter, C A ^a   Cho, Yong Jai ^a,d   Alers, G B ^b,e   Stirling, L A ^c  

^a NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY   (United States)

^b LUCENT TECHNOLOGIES   (United States)

^c NOKIA RESEARCH CENTER   (United States)

^d Korea Science and Engineering Foundation   (South Korea)

^e Novellus Systems   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0011221482     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1324730     Document Type: Article

References (8)

1. Y. Nakagawa and T. Okada, J. Appl. Phys. 68, 556 (1990).
2. G. B. Alers, D. J. Werder, Y. Chabal, H. C. Lu, E. P. Gusev, E. Garfunkel, T. Gustafsson, and R. S. Urdahl, Appl. Phys. Lett. 73, 1517 (1998).
3. C. A. Richter, N. V. Nguyen, and G. B. Alers, Mater. Res. Soc. Symp. Proc. 567, 559 (1999).
4. G. E. Jellison, Jr. and F. A. Modine, Appl. Phys. Lett. 69, 371 (1996).
5. N. V. Nguyen, C. A. Richter, Y. J. Cho, G. B. Alers, and L. A. Stirling (unpublished).
6. See, for instance, J. Taue, in Optical Properties of Solids, edited by F. Abeles (North-Holland, London, 1972), Chap. 5.
7. C. Chaneliere, S. Four, J. L. Autran, R. A. B. Devine, and N. P. Sandler, J. Appl. Phys. 83, 4823 (1998).
8. G. B. Alers, L. A. Stirling, R. B. Vandover, J. P. Chang, D. J. Werder, R. Urdahl, and R. Rajopalan, Mater. Res. Soc. Symp. Proc. 567, 391 (1999).