Stochastic modeling and simultaneous regulation of surface roughness and porosity in thin film deposition

Industrial and Engineering Chemistry Research

Volumn 48, Issue 14, 2009, Pages 6690-6700

  Hu, Gangshi ^a   Orkoulas, Gerassimos ^a   Christofides, Panagiotis D ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONTROL OBJECTIVES; CONTROLLED VARIABLES; DEPOSITION PROCESS; FILM POROSITY; KINETIC MONTE CARLO SIMULATION; LEAST SQUARES METHODS; MICROSCOPIC MODELS; MIGRATION PROCESS; MODEL PREDICTIVE CONTROL ALGORITHM; MODELING AND CONTROL; POROUS THIN FILMS; ROOT MEAN SQUARES; SECOND ORDERS; SET-POINT; SIMULATION RESULT; SIMULTANEOUS CONTROL; SITE OCCUPANCY; STOCHASTIC MODELING; STOCHASTIC PARTIAL DIFFERENTIAL EQUATION; SUBSTRATE TEMPERATURE; SURFACE HEIGHT; THIN-FILM DEPOSITIONS; TIME EVOLUTIONS; TRIANGULAR LATTICE; WILKINSON; WORK FOCUS;

ADSORPTION; CLOSED LOOP CONTROL SYSTEMS; DEPOSITION; LAWS AND LEGISLATION; MATHEMATICAL MODELS; METAL ANALYSIS; MODEL PREDICTIVE CONTROL; ORDINARY DIFFERENTIAL EQUATIONS; PARTIAL DIFFERENTIAL EQUATIONS; PHOTORESISTS; POROSITY; PREDICTIVE CONTROL SYSTEMS; SIMULATORS; STOCHASTIC CONTROL SYSTEMS; STOCHASTIC PROGRAMMING; SURFACE PROPERTIES; SURFACE ROUGHNESS; THIN FILM DEVICES; THIN FILMS;

FILM GROWTH;

EID: 67650779979     PISSN: 08885885     EISSN: None     Source Type: Journal    
DOI: 10.1021/ie900708v     Document Type: Article

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