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Volumn 45, Issue 4, 1997, Pages 1455-1468

A Monte Carlo simulation of the physical vapor deposition of nickel

Author keywords

[No Author keywords available]

Indexed keywords

ACTIVATION ENERGY; ADSORPTION; COMPUTER SIMULATION; CRYSTAL ATOMIC STRUCTURE; DIFFUSION IN SOLIDS; METALLIC FILMS; MONTE CARLO METHODS; MORPHOLOGY; SUBSTRATES; SURFACE ROUGHNESS; THERMAL EFFECTS; VAPOR DEPOSITION;

EID: 0031117636     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/S1359-6454(96)00256-X     Document Type: Article
Times cited : (117)

References (69)
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    • 85033124226 scopus 로고    scopus 로고
    • U.S. Patent No. 4, 788, 082, Nov. 29 (1988)
    • J. J. Schmitt, U.S. Patent No. 4, 788, 082, Nov. 29 (1988).
    • Schmitt, J.J.1
  • 11
  • 13
    • 0001662675 scopus 로고
    • F. C. Frank and J. H. Van der Merwe, Proc. Roy. Soc. A198, 205 (1949); A200, 125 (1949).
    • (1949) Proc. Roy. Soc. , vol.A200 , pp. 125
  • 20
    • 0004277028 scopus 로고
    • McGraw-Hill Book Company, New York
    • K. L. Chopra, Thin Film Phenomena. McGraw-Hill Book Company, New York (1969).
    • (1969) Thin Film Phenomena
    • Chopra, K.L.1
  • 42
    • 0029181607 scopus 로고
    • edited by D. J. Srolovitz, C. A. Volkert, M. J. Fluss and R. J. Kee, Mat. Res. Soc. Symp. Proc., San Francisco
    • C. C. Fang and V. Prasad, in Modeling and Simulation of Thin-Film Processing 389 (edited by D. J. Srolovitz, C. A. Volkert, M. J. Fluss and R. J. Kee), p. 131. Mat. Res. Soc. Symp. Proc., San Francisco (1995).
    • (1995) Modeling and Simulation of Thin-Film Processing , vol.389 , pp. 131
    • Fang, C.C.1    Prasad, V.2
  • 54
    • 0021463618 scopus 로고
    • M. W. Finnis and J. E. Sinclair, Philos. Mag. A50, 45 (1984); 53, 161 (1986).
    • (1986) Philos. Mag. , vol.53 , pp. 161


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.