Kinetic Monte Carlo simulation of Cu thin film growth

Vacuum

Volumn 72, Issue 4, 2004, Pages 405-410

  Zhang, Peifeng ^a   Zheng, Xiaoping ^a   Wu, Suoping ^a   Liu, Jun ^a   He, Deyan ^a  

^a LANZHOU UNIVERSITY   (China)

Author keywords

Kinetic Monte Carlo simulations; Relative density; Surface roughness; Thin film growth

Indexed keywords

ACTIVATION ENERGY; COMPUTER SIMULATION; COPPER; DEPOSITION; DIFFUSION; FILM GROWTH; MONTE CARLO METHODS; SUPERCONDUCTING TRANSITION TEMPERATURE; SURFACE PROPERTIES; SURFACE ROUGHNESS; THERMAL EFFECTS;

ACTIVATION BARRIERS; GROWTH PROCESSES;

THIN FILMS;

EID: 0346119936     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2003.08.013     Document Type: Article

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