Feedback control of surface roughness in sputtering processes using the stochastic Kuramoto-Sivashinsky equation

Computers and Chemical Engineering

Volumn 29, Issue 4, 2005, Pages 741-759

  Lou, Yiming ^a   Christofides, Panagiotis D ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Feedback control; Sputtering processes; Stochastic Kuramoto Sivashinsky equation; Surface roughness

Indexed keywords

COMPUTER SIMULATION; CONTROL EQUIPMENT; DIFFUSION; EROSION; FEEDBACK CONTROL; MATHEMATICAL MODELS; MONTE CARLO METHODS; ORDINARY DIFFERENTIAL EQUATIONS; PARAMETER ESTIMATION; RANDOM PROCESSES; SURFACE ROUGHNESS;

FEEDBACK CONTROLLERS; KURAMOTO-SIVASHINSKY EQUATION (KSE); MICRO-PROCESSES; YIELD FUNCTIONS;

SPUTTERING;

EQUATION; PROCESSING TECHNIQUE; SURFACE ROUGHNESS;

ARTICLE; DECOMPOSITION; DIFFUSION; FEEDBACK SYSTEM; FINITE ELEMENT ANALYSIS; MATHEMATICAL MODEL; MOLECULAR MODEL; MONTE CARLO METHOD; STOCHASTIC MODEL; SURFACE PROPERTY;

EID: 13444304351     PISSN: 00981354     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.compchemeng.2004.09.006     Document Type: Article

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