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Volumn 311, Issue 14, 2009, Pages 3568-3572

Improvement in crystallinity and optical properties of ZnO epitaxial layers by thermal annealed ZnO buffer layers with oxygen plasma

Author keywords

A1. Atomic force microscopy; A1. X ray diffraction; A3. Molecular beam epitaxy; B1. Zinc oxide

Indexed keywords

A1. ATOMIC FORCE MICROSCOPY; A1. X-RAY DIFFRACTION; A3. MOLECULAR BEAM EPITAXY; AFM; B1. ZINC OXIDE; CRYSTALLINITY; DEEP LEVEL EMISSION; HIGH-RESOLUTION X-RAY DIFFRACTION; INTENSITY RATIO; LOW TEMPERATURES; NEAR BAND EDGE EMISSIONS; OXYGEN PLASMAS; P-TYPE SI; PL EMISSION; PL INTENSITY; PLASMA-ASSISTED MOLECULAR BEAM EPITAXY; RADIO FREQUENCY POWER; RF-POWER; ROCKING CURVES; ROOM TEMPERATURE; SI SUBSTRATES; STRUCTURAL AND OPTICAL PROPERTIES; THERMAL-ANNEALING; TREATMENT PROCESS; XRD; ZNO; ZNO BUFFER LAYER;

EID: 67650045877     PISSN: 00220248     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcrysgro.2009.05.010     Document Type: Article
Times cited : (51)

References (32)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.