Oxygen plasma treated epitaxial ZnO thin films for Schottky ultraviolet detection

Journal of Physics D: Applied Physics

Volumn 40, Issue 5, 2007, Pages 1422-1425

  Angadi, Basavaraj ^a   Park, H C ^a   Choi, H W ^a   Choi, J W ^a   Choi, W K ^a  

^a Korea Institute of Science and Technology   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTALLIZATION; CURRENT VOLTAGE CHARACTERISTICS; EPITAXIAL GROWTH; MOLECULAR BEAM EPITAXY; X RAY PHOTOELECTRON SPECTROSCOPY; ZINC OXIDE;

OHMIC BEHAVIOURS; OXYGEN PLASMA TREATMENT; PHOTORESPONSIVITIES; SCHOTTKY JUNCTIONS;

THIN FILMS;

EID: 33947637178     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/40/5/016     Document Type: Article

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