RF discharge under the influence of a transverse magnetic field

Plasma Sources Science and Technology

Volumn 17, Issue 4, 2008, Pages

  Barnat, E V ^a   Miller, P A ^a   Paterson, A M ^b  

^a SANDIA NATIONAL LABORATORIES   (United States)

^b APPLIED MATERIALS INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED MAGNETIC FIELDS; ARGON DISCHARGES; ARGON PRESSURE; COLLISION FREQUENCY; CYCLOTRON FREQUENCY; DC VOLTAGE; ELECTRICAL CHARACTERISTIC; GASEOUS ELECTRONICS; LASER INDUCED FLUORESCENCE; OPTICAL EMISSIONS; OPTICAL STATE; RF DISCHARGE; RF VOLTAGE; RF-POWER; SPATIAL DISTRIBUTION; TEMPORAL EVOLUTION; TRANSVERSE MAGNETIC FIELD; VERTICAL PLANE; VOLTAGE DROP;

ARGON; ELECTRIC DISCHARGES; ELECTRIC FIELDS; ELECTRON MOBILITY; MAGNETIC FIELD MEASUREMENT; MAGNETIC MATERIALS; MAGNETISM; PLASMAS;

MAGNETIC FIELD EFFECTS;

EID: 67649845500     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/17/4/045005     Document Type: Article

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