ELIAS: An accurate and extensible lithography aerial image simulator with improved numerical algorithms

IEEE Transactions on Semiconductor Manufacturing

Volumn 22, Issue 2, 2009, Pages 276-279

  Yu, Peng ^a   Pan, David Z ^a  

^a The University of Texas at Austin   (United States)

Author keywords

Accuracy; aerial image simulation; C++; ELIAS; fast Fourier transform (FFT); Hopkins equation; lithography simulation; numerical algorithm; recursive integration; runtime; Transmission cross coefficient (TCC)

Indexed keywords

ACCURACY; AERIAL IMAGE SIMULATION; C++; ELIAS; HOPKINS EQUATION; LITHOGRAPHY SIMULATION; NUMERICAL ALGORITHM; RECURSIVE INTEGRATION; RUNTIME; TRANSMISSION CROSS COEFFICIENT (TCC);

ALGORITHMS; FAST FOURIER TRANSFORMS; MACHINE DESIGN; MASKS; RECURSIVE FUNCTIONS; SIMULATORS;

MATHEMATICAL MODELS;

EID: 67649283799     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2009.2017652     Document Type: Article

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