A novel intensity based optical proximity correction algorithm with speedup in lithography simulation

IEEE/ACM International Conference on Computer-Aided Design, Digest of Technical Papers, ICCAD

Volumn , Issue , 2007, Pages 854-859

  Yu, Peng ^a   Pan, David Z ^a  

^a The University of Texas at Austin   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COMPUTER-AIDED DESIGN; EDGE PLACEMENT ERROR; INTENSITY BASED; INTERNATIONAL CONFERENCES; LITHOGRAPHY SIMULATIONS; OPC ALGORITHMS; OPTICAL-PROXIMITY CORRECTION; RUN-TIME; SENSITIVITY INFORMATION; SPEED UPS;

BOOLEAN FUNCTIONS; DESIGN; OPTICAL ENGINEERING; OPTICAL RESOLVING POWER; SPEED;

PHOTOLITHOGRAPHY;

EID: 50249119167     PISSN: 10923152     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ICCAD.2007.4397371     Document Type: Conference Paper

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