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Volumn 21, Issue 4, 2008, Pages 638-645

Fast lithography image simulation by exploiting symmetries in lithography systems

Author keywords

Aerial simulation; Lithography simulation; Optimal coherent approximations (OCAs); Symmetry; Transmission cross coefficient (TCC)

Indexed keywords

SEMICONDUCTOR DEVICE MANUFACTURE; SYSTEMS ENGINEERING;

EID: 55649107288     PISSN: 08946507     EISSN: None     Source Type: Journal    
DOI: 10.1109/TSM.2008.2005380     Document Type: Article
Times cited : (7)

References (11)
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  • 2
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  • 3
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  • 4
    • 50249132528 scopus 로고    scopus 로고
    • Collaborative innovation: IBM's immersion lithography strategy for 65 nm and 45 nm half-pitch nodes and beyond
    • G. A. Gomba, "Collaborative innovation: IBM's immersion lithography strategy for 65 nm and 45 nm half-pitch nodes and beyond," in Proc. SPIE 6521, 2007.
    • (2007) Proc. SPIE 6521
    • Gomba, G.A.1
  • 5
    • 0028515483 scopus 로고
    • Phase-shifting masks for microlithography: Automated design and mask requirements
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    • Y. C. Pati and T. Kailath, "Phase-shifting masks for microlithography: Automated design and mask requirements," J. Opt. Soc. Amer. A, vol. 11, pp. 2438-2452, Sep. 1994.
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  • 6
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    • Exploiting structure in fast aerial image computation for integrated circuit patterns
    • Feb
    • Y. Pati, A. Ghazanfarian, and R. Pease, "Exploiting structure in fast aerial image computation for integrated circuit patterns," IEEE Trans. Semicond. Manuf., vol. 10, no. 1, pp. 62-74, Feb. 1997.
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    • Pati, Y.1    Ghazanfarian, A.2    Pease, R.3
  • 9
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    • Improved modeling performance with an adapted vectorial formulation of the Hopkins imaging equation
    • Jun
    • K. Adam, Y. Granik, A. Torres, and N. B. Cobb, "Improved modeling performance with an adapted vectorial formulation of the Hopkins imaging equation," in Proc. SPIE 5040, Jun. 2003, pp. 78-91.
    • (2003) Proc. SPIE 5040 , pp. 78-91
    • Adam, K.1    Granik, Y.2    Torres, A.3    Cobb, N.B.4
  • 10
    • 33644786247 scopus 로고    scopus 로고
    • Polarization effects in immersion lithography
    • K. Adam and W. Maurer, "Polarization effects in immersion lithography," J. Micro/Nanolithography, MEMS MOEMS, vol. 4, no. 3, p. 031106, 2005.
    • (2005) J. Micro/Nanolithography, MEMS MOEMS , vol.4 , Issue.3 , pp. 031106
    • Adam, K.1    Maurer, W.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.