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Volumn 21, Issue 4, 2008, Pages 638-645
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Fast lithography image simulation by exploiting symmetries in lithography systems
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Author keywords
Aerial simulation; Lithography simulation; Optimal coherent approximations (OCAs); Symmetry; Transmission cross coefficient (TCC)
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Indexed keywords
SEMICONDUCTOR DEVICE MANUFACTURE;
SYSTEMS ENGINEERING;
AERIAL SIMULATION;
LITHOGRAPHY SIMULATION;
OPTIMAL COHERENT APPROXIMATIONS (OCAS);
SYMMETRY;
TRANSMISSION CROSS COEFFICIENT (TCC);
LITHOGRAPHY;
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EID: 55649107288
PISSN: 08946507
EISSN: None
Source Type: Journal
DOI: 10.1109/TSM.2008.2005380 Document Type: Article |
Times cited : (7)
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References (11)
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