Fast lithography simulation under focus variations for OPC and layout optimizations

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6156, Issue , 2006, Pages

  Yu, Peng ^a   Pan, David Z ^a   Mack, Chris A ^a,b  

^a The University of Texas at Austin   (United States)

^b UNIVERSITY OF TEXAS AT AUSTIN   (United States)

Author keywords

Depth of Focus; Fast Lithography Simulation; Model Based OPC; Process Variation

Indexed keywords

DEPTH-OF-FOCUS; FAST LITHOGRAPHY SIMULATIONS; MODEL BASED OPC; PROCESS VARIATION;

APPROXIMATION THEORY; COMPUTER SOFTWARE; ERROR DETECTION; IMAGE ANALYSIS; MASKS; MEASUREMENT THEORY; OPTICAL ENGINEERING; OPTIMIZATION; PHASE SHIFT; PRODUCT DESIGN; PROXIMITY INDICATORS; ROBUSTNESS (CONTROL SYSTEMS);

LITHOGRAPHY;

EID: 33745766207     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.658110     Document Type: Conference Paper

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