Three-dimensional mask effect approximate modeling for sub-50 nm node device OPC

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6521, Issue , 2007, Pages

  Suh, Sungsoo ^a   Lee, Sukjoo ^a   Back, Kyoung Yoon ^a   Lee, Sook ^a   Kim, Youngchang ^a   Kim, Sangwook ^a   Chun, Yong Jin ^a  

^a SAMSUNG Electronics   (South Korea)

Author keywords

3D mask; Lithography; OPC; OPC verification

Indexed keywords

APPROXIMATION THEORY; CALIBRATION; COMPUTER SIMULATION; DATA STORAGE EQUIPMENT; OPTICAL SYSTEMS; POLARIZATION;

MASK MODELS; OPC VERIFICATION; OPTICAL PROXIMITY CORRECTION;

PHOTOMASKS;

EID: 35148882520     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711946     Document Type: Conference Paper

References (11)

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