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Volumn 6521, Issue , 2007, Pages

Model-based assist feature generation

Author keywords

Assist feature; Image based; Model based; Pixel based; RET

Indexed keywords

ALGORITHMS; IMAGING SYSTEMS; MATHEMATICAL MODELS; OPTIMIZATION; PIXELS;

EID: 35248892490     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.711504     Document Type: Conference Paper
Times cited : (14)

References (13)
  • 1
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    • Optical proximity correction method for intermediate-pitch features using sub-resolution scattering bars on a mask,
    • U.S. patent 5,821,014
    • J. F. Chen, "Optical proximity correction method for intermediate-pitch features using sub-resolution scattering bars on a mask," U.S. patent 5,821,014 (1998)
    • (1998)
    • Chen, J.F.1
  • 2
    • 25144496964 scopus 로고    scopus 로고
    • 65nm Node Gate Pattern Using Attenuated Phase Shift Mask with Off-axis Illumination and Sub-Resolution Assist Features
    • G. Zhang et al., "65nm Node Gate Pattern Using Attenuated Phase Shift Mask with Off-axis Illumination and Sub-Resolution Assist Features," Proc. SPIE Vol. 5754, 760-772 (2005)
    • (2005) Proc. SPIE , vol.5754 , pp. 760-772
    • Zhang, G.1
  • 4
    • 71549126234 scopus 로고    scopus 로고
    • Optimum mask and source patterns to print a given shape
    • 3 Vol. 1, No 1, 13-30, (2002)
    • (2002) 3 , vol.1 , Issue.1 , pp. 13-30
    • Rosenbluth, A.E.1
  • 5
    • 35248865657 scopus 로고    scopus 로고
    • Towards Automatic Mask and Source Optimization for Lithography
    • A. Erdmann et al., "Towards Automatic Mask and Source Optimization for Lithography," Proc. SPIE Vol. 5377, 648-657 (2004)
    • (2004) Proc. SPIE , vol.5377 , pp. 648-657
    • Erdmann, A.1
  • 6
    • 28544444163 scopus 로고    scopus 로고
    • Simultaneous Source Mask Optimization (SMO)
    • R. Socha et al., "Simultaneous Source Mask Optimization (SMO)," Proc. SPIE Vol. 5853, 180-193 (2005)
    • (2005) Proc. SPIE , vol.5853 , pp. 180-193
    • Socha, R.1
  • 7
    • 25144486100 scopus 로고    scopus 로고
    • Solving Inverse Problems of Optical Microlithography
    • Y. Granik, "Solving Inverse Problems of Optical Microlithography, " Proc. SPIE Vol. 5754, 506-526 (2005)
    • (2005) Proc. SPIE , vol.5754 , pp. 506-526
    • Granik, Y.1
  • 8
    • 33745777156 scopus 로고    scopus 로고
    • Fast Inverse Lithography Technology
    • D. S. Abrams, "Fast Inverse Lithography Technology," Proc. SPIE Vol. 6154, 61541J 1-9 (2006)
    • (2006) Proc. SPIE , vol.6154 J , pp. 1-9
    • Abrams, D.S.1
  • 9
    • 33846589378 scopus 로고    scopus 로고
    • Inverse lithography technology at low k1: Placement and accuracy of assist features
    • 63494T 1-11
    • An. Moore et al., "Inverse lithography technology at low k1: placement and accuracy of assist features," Proc. SPIE Vol. 6349, 63494T 1-11 (2006)
    • (2006) Proc. SPIE , vol.6349
    • Moore, A.1
  • 10
    • 33748031740 scopus 로고    scopus 로고
    • Model-Based Insertion of Assist Features Using Pixel Inversion Method: Implementation in 65nm Node
    • 62832Y 1-12
    • C.Y. Hung et al., "Model-Based Insertion of Assist Features Using Pixel Inversion Method: Implementation in 65nm Node," Proc. SPIE Vol. 6283, 62832Y 1-12 (2006)
    • (2006) Proc. SPIE , vol.6283
    • Hung, C.Y.1
  • 11
    • 3843105673 scopus 로고    scopus 로고
    • Contact hole reticle optimization by using interference mapping lithography (IML)
    • R. J. Socha et al., "Contact hole reticle optimization by using interference mapping lithography (IML)," Proc. SPIE Vol. 5377, 222-240, (2004).
    • (2004) Proc. SPIE , vol.5377 , pp. 222-240
    • Socha, R.J.1
  • 12
    • 11844272070 scopus 로고    scopus 로고
    • Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node
    • D. J. Van Den Broeke et al, "Application of CPL with Interference Mapping Lithography to generate random contact reticle designs for the 65-nm node," Proc. SPIE Vol. 5446, 550-559 (2004).
    • (2004) Proc. SPIE , vol.5446 , pp. 550-559
    • Van Den Broeke, D.J.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.