SEM image contouring for OPC model calibration and verification

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6520, Issue PART 1, 2007, Pages

  Tabery, Cyrus ^a   Morokuma, Hidetoshi ^b   Matsuoka, Ryoichi ^b   Page, Lorena ^c   Bailey, George E ^d   Kusnadi, Ir ^d   Do, Thuy ^d  

^a ADVANCED MICRO DEVICES   (United States)

^b HITACHI HIGH TECHNOLOGIES CORPORATION   (Japan)

^c Hitachi High Technologies America   (United States)

^d MENTOR GRAPHICS CORPORATION   (United States)

Author keywords

CD SEM; Design based metrology; Edge placement error; Model calibration; OPC; SEM contouring

Indexed keywords

DESIGN BASED METROLOGY; DESIGN LAYOUTS; LITHOGRAPHY MODELS; METROLOGY SYSTEMS;

DATA TRANSFER; IMAGE QUALITY; LITHOGRAPHY; OPTICAL DATA STORAGE; PROCESS CONTROL; SCANNING ELECTRON MICROSCOPY;

IMAGE ANALYSIS;

EID: 35148879648     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.714389     Document Type: Conference Paper

References (12)

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