A focus exposure matrix model for full chip lithography manufacturability check and optical proximity correction

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6283 I, Issue , 2006, Pages

  Zhang, Youping ^a   Feng, Mu ^a   Liu, Hua Yu ^a  

^a Brion Technologies Inc   (United States)

Author keywords

Focus Exposure Matrix; Lithography manufacturability check (LMC); Lithography model; Model calibration; Optical proximity correction (OPC)

Indexed keywords

COMPUTER SIMULATION; ERROR CORRECTION; FINITE ELEMENT METHOD; MATHEMATICAL MODELS; MICROPROCESSOR CHIPS; SILICON WAFERS;

FOCUS EXPOSURE MATRIX; LITHOGRAPHY MANUFACTURABILITY CHECK (LMC); LITHOGRAPHY MODEL; OPTICAL PROXIMITY CORRECTION (OPC);

LITHOGRAPHY;

EID: 33748041652     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.681856     Document Type: Conference Paper

References (7)

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