Characterization of etch resistance property of imprinting resin

Electronic Materials Letters

Volumn 4, Issue 3, 2008, Pages 141-145

  Hwang, Seon Yong ^a   Jung, Ho Yong ^a   Yang, Ki Yeon ^a   Jeong, Jun Ho ^b   Choi, Kyung Woo ^c   Lee, Heon ^a  

^a Korea University   (South Korea)

^b Korea Institute of Machine and Materials   (South Korea)

^c Korea Institute of Nuclear Safety (KINS)   (South Korea)

Author keywords

Benzylmethacrylate; Bi layer imprint; Etch resistance; Imprint resin; M PDMS (methacryloxypropyl terminated poly dimethylsiloxanes); Nanoimprint lithography

Indexed keywords

EID: 67349191599     PISSN: 17388090     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (17)

1. H. Lee, S. H. Hong, K. Y. Yang, and G. Y. Jung, Microelectron. Eng. 84, 573 (2007).
2. V. Malyarchuk, F. Hua, N. H. Mack, V. T. Velasquez, J. O. White, R. G. Nuzzo, and J. A. Rogers, Opt. Express 13/15, 5669 (2005).
3. K. J. Byeon, S. Y. Hwang, and H. Lee, Appl. Phys. Lett. 91, 091106 (2007).
4. G. Luo, I. Maximov, D. Adolph, M. Graczyk, P. Carlberg, S. Nilsson, D. Hessman, T. Zhu, Z. Liu, H. Q. Xu, and L. Montelius, Nanotechnology 17, 1906 (2006).
5. Y. C. Tung and K. Kurabayashi, Appl. Phys. Lett. 86, 161113 (2005).
6. M. J. Lee and Y. S. Kim, Electron. Mater. Lett. 3, 155 (2007).
7. S. H. Hong, J. H. Lee, and H. Lee, Microelectron. Eng. 84, 977 (2007).
8. H. Lee, S. H. Hong, and K. Y. Yang, Appl. Phys. Lett. 88, 43112 (2006).
9. W.C. Liao and S. L. C. Hsu, Nanotechnology 18, 065303 (2007).
10. L. Jay Guo, Adv. Mater. 19, 495 (2007).
11. N. V. Le, W. J. Dauksher, K. A. Gehoski, K. J. Nordquist, E. Ainley, and P. Mangat, Microelectron. Eng. 83, 839 (2006).
12. K. Nakamatsu, K. Tone, and S. Matsui, Jpn. J. Appl. Phys. 44/11, 8186 (2005).
13. X. Sun, L. Zhuang, W. Zhang, and S. Y. Chou, J. Vac. Sci. Technol. B 16/6, 3922 (1998).
14. G. Y. Jung, W. Wu, S. Ganapathiappan, D. A. A. Ohlberg, M. Saif Islam, X. Li, D. L. Olynick, H. Lee, Y. Chen, S. Y. Wang, W. M. Tong, and R. S. Williams, Appl. Phys. A 81, 1331 (2005).
15. H. Lee, S. H. Hong, K. Y. Yang, and K. W. Choi, Microelectron. Eng. 83, 323 (2006).
16. H. Lee and G.-Y. Jung, Microelectron. Eng. 77, 168 (2005).
17. H. Ge, W. Wu, Z. Li, G. Y. Jung, D. Olynick, Y. Chen, J. Alexander Liddle, S. Y. Wang, and R. Stanley Williams, Nano Lett. 5/1, 179 (2005).