Issues on nanoimprint lithography with a single-layer resist structure

Applied Physics A: Materials Science and Processing

Volumn 81, Issue 7, 2005, Pages 1331-1335

  Jung, G Y ^a   Wu, W ^a   Ganapathiappan, S ^a   Ohlberg, D A A ^a   Saif Islam, M ^b   Li, X ^a   Olynick, D L ^c   Lee, H ^d   Chen, Y ^e   Wang, S Y ^a   Tong, W M ^a,f   Williams, R S ^a  

^a HEWLETT PACKARD LABORATORIES   (United States)

^b University of California   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

^d Korea University   (South Korea)

^e UNIVERSITY OF CALIFORNIA   (United States)

^f HEWLETT PACKARD COMPANY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

HYDROPHILICITY; HYDROPHOBICITY; PRESSURE EFFECTS; SUBSTRATES; THERMAL EFFECTS; VISCOSITY;

NANOIMPRINT LITHOGRAPHY (NIL); RESIST STRUCTURE; ROOM TEMPERATURE; SUBSTRATE SURFACE;

NANOTECHNOLOGY;

EID: 24944542419     PISSN: 09478396     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00339-005-3313-2     Document Type: Article

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